Current status of Nanonex nanoimprint solutions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 213-221

  Tan, Hua ^a   Kong, Linshu ^a   Li, Mingtao ^a   Steere, Colby ^a   Koecher, Larry ^a  

^a Nanonex Corporation   (United States)

Author keywords

Air cushion press; Lithography; Nanofabrication; Nanonex; NGL; NIL; P NIL; T NIL

Indexed keywords

AIR CUSHIONING; CROSSLINKING; DEFORMATION; MOLDS; NANOTECHNOLOGY; SEPARATION;

AIR CUSHION PRESS; NANOIMPRINT LITHOGRAPHY (NIL); NANONEX; NEXT GENERATION LITHOGRAPHY (NGL); PHOTO-CURABLE NANOIMPRINT (P-NIL); THERMAL NANOIMPRINT (T-NIL);

LITHOGRAPHY;

EID: 3843139363     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537241     Document Type: Conference Paper

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