Line width reproducibility of photo-nanoimprints

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5622-5626

  Hiroshima, Hiroshi ^a   Kurashima, Yuichi ^a   Komuro, Masanori ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Oita Industrial Research Institute   (Japan)

Author keywords

Atomic force microscope; Identity; Imprint lithography; Line width; Nanoimprint; Photo nanoimprint; Reproducibility; SOG replica method; UV nanoimprint

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; ETCHING; FABRICATION; POLYMERS;

ANISOTROPY WET ETCHING; IDENTITY; IMPRINT LITHOGRAPHY; NANOIMPRINT; REPRODUCIBILITY; SOG REPLICA METHOD;

SPIN GLASS;

EID: 31844454704     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5622     Document Type: Article

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