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Volumn 39, Issue 12 B, 2000, Pages 6836-6842

Sub-10 nm linewidth and overlay performance achieved with a fine-Tuned EBPG-5000 TFE electron beam lithography system

Author keywords

Benchmarking; Denoising; Electron beam lithography; HSQ; Hydrogen silsesquioxane; Nanoelectronics; Nanolithography; Overlay accuracy

Indexed keywords

BENCHMARKING; HYDROGEN INORGANIC COMPOUNDS; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; OPTIMIZATION;

NANOELECTRONICS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034429405 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.6836 Document Type: Article

Times cited : (80)

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