Multiple imprinting in UV-based nanoimprint lithography: Related material issues

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 407-413

  Bender, M ^a   Otto, M ^a   Hadam, B ^a   Spangenberg, B ^a   Kurz, H ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Anti adhesion; Nanoimprint; Step and repeat; UV curable

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; FLUORINE; MICROANALYSIS; MICROSTRUCTURE; MONOLAYERS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SILICON; SURFACE CHEMISTRY; ULTRAVIOLET RADIATION;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY;

LITHOGRAPHY;

EID: 0036643633     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00470-7     Document Type: Conference Paper

References (6)