Simulation of fluid flow in the Step and Flash Imprint Lithography process

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 200-209

  Reddy, Shravanthi ^a   Bonnecaze, Roger T ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Imprint lithography; Imprint Time; Multi Drop Imprint; Simulation

Indexed keywords

IMPRINT LITHOGRAPHY; IMPRINT TIME; MULTI-DROP IMPRINT; STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

BOUNDARY CONDITIONS; COALESCENCE; COMPUTER SIMULATION; INTERFACES (MATERIALS); LITHOGRAPHY; LUBRICATION;

FLOW OF FLUIDS;

EID: 24644457068     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601413     Document Type: Conference Paper

References (7)

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2. Bailey, T.C et. al., "Recent advances in Step and Flash Imprint Lithography", Proc. 39th Interface Symposium, 2002
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4. M. Colburn et al. Microelectronics Engineering 75, 321-329, 2004
5. Deen, Analysis of Transport Phenomena, 275-276, Oxford University Press, New York, 1998
6. Reddy, S, and Bonnecaze, RT, submitted for publication
7. Hirt, C.W., and Nichols, B.D., "Volume of Fluid (VOF) Method for the Dynamics of Free Boundaries", J. of Comp. Phys., 39, 201-225, 1981