Ramifications of lubrication theory on imprint lithography

Microelectronic Engineering

Volumn 75, Issue 3, 2004, Pages 321-329

  Colburn, Matthew ^a,b   Choi, Byung Jin ^a   Sreenivasan, S V ^a   Bonnecaze, Roger T ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Fluid dynamics; Imprint; Lithography

Indexed keywords

IMPRINTS; METALIZATION; THERMAL EMBOSSING; TOPOGRAPHY;

ACTUATORS; CAPILLARITY; FLUID DYNAMICS; LITHOGRAPHY; PHOTOPOLYMERIZATION; PRESSURE EFFECTS; SENSITIVITY ANALYSIS; SPIN COATING; THERMAL EFFECTS; THIN FILMS; THRESHOLD ELEMENTS; VISCOSITY;

LUBRICATION;

EID: 4344692571     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.05.010     Document Type: Article

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