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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 11, 2005, Pages 8186-8188

Nanoimprint and lift-off process using poly (vinyl alcohol)

(3) Nakamatsu, Ken Ichiro a Tone, Katsuhiko b Matsui, Shinji a

a UNIVERSITY OF HYOGO (Japan)

b Meisyo Co (Japan)

Author keywords

Bilayer structure; Ecologically process; Hydrogen silsesquioxane (HSQ); Lithography; Nanoimprint; Poly(vinyl alcohol); Water lift off

Indexed keywords

DRY ETCHING; ECOLOGY; POLYMETHYL METHACRYLATES; POLYVINYL ALCOHOLS; WATER;

BILAYER STRUCTURE; HYDROGEN SILSESQUIOXANE (HSQ); NANOIMPRINT; WATER LIFT-OFF;

LITHOGRAPHY;

EID: 31544468353 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.44.8186 Document Type: Article

Times cited : (25)

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