An analysis: Traditional semiconductor lithography versus emerging technology (nano imprint)

Proceedings - Winter Simulation Conference

Volumn 2005, Issue , 2005, Pages 2218-2222

  Trybula, Walt ^a   Wright, Robert L ^b   Adusumilli, Kranthi Mitra ^b   Goodall, Randy K ^a  

^a SEMATECH   (United States)

^b ISMI   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC MANUFACTURING PLANTS; MANUFACTURING DATA PROCESSING; PERSONNEL; PRODUCT DEVELOPMENT; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY TRANSFER;

MANUFACTURING FACILITIES; NANO IMPRINT;

LITHOGRAPHY;

EID: 33846674259     PISSN: 08917736     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/WSC.2005.1574509     Document Type: Conference Paper

References (5)

1. Hector S. 2005. Personal Communication re imprint template costs.
2. Stewart M., et al. 2005. Nanofabrication with Step and Flash Imprint Lithography. In Proceedings of 2005 SPIE Microlithography Conference.
3. Trybula W., and D. Newberry. 2004. Nano-the next technology?. ECTC Professional Development Course.
4. Trybula W., et al. 2001. Financial Impact of Technology Acceleration on Semiconductor Masks. In Proceedings of BACUS 2001 Symposium.
5. Wright Williams and Kelly Newsletter. Winter 2004. SFIL Lithography Cost of Ownership.. Available online via http://www.wwk.com/newsletter.html [acessed May 1, 2005].