Low-cost nanostructure patterning using step and flash imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4608, Issue , 2002, Pages 187-194

  Sreenivasan, S V ^a   Willson, C G ^b   Schumaker, N E ^e   Resnick, D J ^e  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c MOLECULAR IMPRINTS INC   (United States)

^d MOTOROLA INC   (United States)

^e NONE

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; MASKS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY;

COST OF OWNERSHIP; EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY; NANOPATTERNING TECHNIQUE; NANOSTRUCTURE PATTERNING; PATTERN NANOSTRUCTURES; STEP AND FLASH IMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 0036029538     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.437804     Document Type: Article

References (4)

1. Mathew Colburn, Todd Bailey, Byung Jin Choi, John G. Ekerdt, S. V. Sreenivasan, C. Grant Willson' Step and Flash Imprint Lithography' Solid State Technology, July 2001.
2. S. Y. Chou, P.R. Krauss, P. J. Renstrom' Nanoimprint lithography' J. Vac. Sci., Tech. B, 1996. 14(6): p. 4129.
3. Y. Xia, G.M. Whitesides' Soft Lithography' Angew. Chem. Int. Ed. Engl., 1998. 37: p. 550.
4. SEMATECH's Lithography Cost of Ownership http://www.sematech.org/public/resources/coo/index.htm