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Volumn 82, Issue 1, 2005, Pages 60-70

Simulation of fluid flow in the step and flash imprint lithography process

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; FLUID MECHANICS; LUBRICATION; MATHEMATICAL MODELS; MONOMERS; OPTICAL SYSTEMS; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTORESISTS;

EID: 24644474741     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.06.002     Document Type: Article
Times cited : (77)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.