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Volumn 82, Issue 1, 2005, Pages 60-70
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Simulation of fluid flow in the step and flash imprint lithography process
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Author keywords
[No Author keywords available]
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Indexed keywords
APPROXIMATION THEORY;
FLUID MECHANICS;
LUBRICATION;
MATHEMATICAL MODELS;
MONOMERS;
OPTICAL SYSTEMS;
OPTIMIZATION;
PHOTOLITHOGRAPHY;
PHOTORESISTS;
CAPILLARY NUMBERS;
IMPRINTING;
LUBRICATION THEORY;
MULTIPLE FLUID DROPS;
STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);
FLOW OF FLUIDS;
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EID: 24644474741
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2005.06.002 Document Type: Article |
Times cited : (77)
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References (12)
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