Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Journal of Applied Physics

Volumn 112, Issue 9, 2012, Pages

  Stranak, Vitezslav ^a,b   Herrendorf, Ann Pierra ^a   Drache, Steffen ^a   Cada, Martin ^c   Hubicka, Zdenek ^c   Bogdanowicz, Robert ^a   Tichy, Milan ^d   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b UNIVERSITY OF SOUTH BOHEMIA   (Czech Republic)

^c INSTITUTE OF PHYSICS   (Czech Republic)

^d CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE CURRENTS; ELECTRON CYCLOTRON WAVE RESONANCES; ENERGY-RESOLVED MASS SPECTROMETRY; HIGH CONCENTRATION; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); LOW PRESSURES; PULSED SPUTTERING; SPUTTERED PARTICLES; TIME-RESOLVED EMISSION SPECTROSCOPY;

INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; PLASMA DIAGNOSTICS;

MAGNETRON SPUTTERING;

EID: 84870858440     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4764102     Document Type: Article

References (69)

1. V. Kouznetsov, K. Macak, J. M. Schneider, U. Helmersson, and I. Petrov, Surf. Coat. Technol. 122, 293 (1999). 10.1016/S0257-8972(99)00292-3
2. K. Sarakinos, J. Alami, and S. Konstantinidis, Surf. Coat. Technol. 204, 1661 (2010). 10.1016/j.surfcoat.2009.11.013
3. J. T. Gudmundsson, N. Brenning, D. Lundin, and U. Helmersson, J. Vac. Sci. Technol. A 30, 030801 (2012). 10.1116/1.3691832
4. J. T. Gudmundsson, J. Alami, and U. Helmersson, Appl. Phys. Lett. 78, 3427 (2001). 10.1063/1.1376150
5. U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, Thin Solid Films 513, 1 (2006). 10.1016/j.tsf.2006.03.033
6. A. Vethuska and A. P. Ehiasarian, J. Phys. D: Appl. Phys. 41, 015204 (2008). 10.1088/0022-3727/41/1/015204
7. V. Stranak, M. Quaas, R. Bogdanowicz, H. Steffen, H. Wulff, Z. Hubicka, M. Tichy, and R. Hippler, J. Phys. D: Appl. Phys. 43, 285203 (2010). 10.1088/0022-3727/43/28/285203
8. V. Stranak, S. Drache, M. Cada, Z. Hubicka, M. Tichy, and R. Hippler, Contrib. Plasma Phys. 51, 237 (2011). 10.1002/ctpp.201000065
9. J. Alami, K. Sarakinos, F. Uslu, C. Klever, J. Dukwen, and M. Wuttig, J. Phys. D: Appl. Phys. 42, 115204 (2009). 10.1088/0022-3727/42/11/115204
10. A. P. Ehiasarian, W. D. Munz, L. Hultman, U. Helmersson, and I. Petrov, Surf. Coat. Technol. 267, 163 (2003). 10.1016/S0257-8972(02)00479-6
11. S. Konstantinidis, J. P. Dauchot, M. Ganciu, A. Ricard, and M. Hecq, J. Appl. Phys. 99, 013307 (2006). 10.1063/1.2159555
12. V. Stranak, Z. Hubicka, P. Adamek, Surf. Coat. Technol. 201, 2512 (2006). 10.1016/j.surfcoat.2006.04.013
13. D. Lundin, M. Stahl, H. Kersten, and U. Helmersson, J. Phys. D.: Appl. Phys. 42, 185202 (2009). 10.1088/0022-3727/42/18/185202
14. J. Bohlmark, M. Lattemann, J. T. Gudmundsson, Thin Solid Films 515, 1522 (2006). 10.1016/j.tsf.2006.04.051
15. J. Bohlmark, J. Alami, C. Christou, A. Ehiasarian, and U. Helmersson, J. Vac. Sci. Technol. A 23, 18 (2005). 10.1116/1.1818135
16. J. Vlcek, P. Kudlacek, K. Burcalova, and J. Musil, J. Vac. Sci. Technol. A 25 (1), 42 (2007). 10.1116/1.2388954
17. J. Hopwood, Ionized Physical Vapor Deposition (Academic, 2000).
18. M. Samuelsson, D. Lundin, J. Jensen, M. A. Raadu, J. T. Gudmundsson, and U. Helmersson, Surf. Coat. Technol. 205, 591 (2010). 10.1016/j.surfcoat.2010.07. 041
19. V. Sittinger, F. Ruske, W. Werner, C. Jacobs, B. Szyszka, D. Christie, Thin Solid Films 516, 5847 (2008). 10.1016/j.tsf.2007.10.031
20. M. Lattemann, U. Helmersson, and J. E. Greene, Thin Solid Films 518, 5978 (2010). 10.1016/j.tsf.2010.05.064
21. A. P. Ehiasarian, J. G. Wen, and I. Petrov, J. Appl. Phys. 101, 054301 (2007). 10.1063/1.2697052
22. S. Konstantinidis, J. P. Dauchot, and M. Hecq, Thin Solid Films 515, 1182 (2006). 10.1016/j.tsf.2006.07.089
23. J. Alami, P. Eklund, J. M. Andersson, Thin Solid Films 515, 3434 (2007). 10.1016/j.tsf.2006.10.013
24. J. Alami, P. O. A. Persson, D. Music, J. Vac. Sci. Technol. A 23, 278 (2005). 10.1116/1.1861049
25. V. Stranak, H. Wulff, R. Bogdanowicz, S. Drache, Z. Hubicka, M. Cada, M. Tichy, and R. Hippler, Eur. Phys. J. D. 64, 427 (2011). 10.1140/epjd/e2011- 20393-7
26. V. Stranak, H. Wulff, H. Rebl, C. Zietz, K. Arndt, Mater. Sci. Eng. C 31, 1512 (2011). 10.1016/j.msec.2011.06.009
27. V. Stranak, S. Block, S. Drache, Z. Hubicka, C. A. Helm, L. Jastrabik, M. Tichy, and R. Hippler, Surf. Coat. Technol. 205, 2755 (2011). 10.1016/j.surfcoat.2010.10.030
28. B. A. Movchan and A. V. Demshishin, Fiz. Met. Metalloved 28, 653 (1969).
29. J. A. Thornton, J. Vac. Sci. Technol. 11/4, 666 (1974). 10.1116/1.1312732
30. A. Anders, Thin Solid Films 518, 4087 (2010). 10.1016/j.tsf.2009.10.145
31. A. P. Ehiasarian, A. Hecimovic, T. de los Arcos, R. New, V. Schulz-von der Gathen, M. Boke, and J. Winter, Appl. Phys. Lett. 100, 114101 (2012). 10.1063/1.3692172
32. D. Lundin and K. Sarakinos, J. Mar. Res. 27, 780 (2012). 10.1557/jmr.2012.8
33. A. D. Pajdarova, J. Vlcek, P. Kudlacek, and J. Lukas, Plasma Sources Sci. Technol. 18, 025008 (2009). 10.1088/0963-0252/18/2/025008
34. A. Mishra, J. P. Kelly, and J. W. Bradley, J. Phys. D: Appl. Phys. 44, 425201 (2011). 10.1088/0022-3727/44/42/425201
35. J. M. Sanders, A. Rauch, R. J. Mendelsberg, and A. Anders, Rev. Sci. Instrum. 82, 093505 (2011). 10.1063/1.3640408
36. P. Poolcharuansin, B. Liebig, and J. Bradley, IEEE Trans. Plasma. Sci. 38, 3007 (2010). 10.1109/TPS.2010.2069572
37. G. Y. Yushkov and A. Anders, IEEE Trans. Plasma. Sci. 38, 3028 (2010). 10.1109/TPS.2010.2063041
38. P. Vasina, M. Mesko, J. C. Imbert, M. Ganciu, C. Boisse-Laporte, Plasma Sources Sci. Technol. 16, 501 (2007). 10.1088/0963-0252/16/3/009
39. A. Anders and G. Y. Yushkov, J. Appl. Phys. 105, 073301 (2009). 10.1063/1.3097390
40. R. Bandorf, M. Vergohl, O. Werner, V. Sittinger, and G. Brauer, Vacuum in Forschung und Praxis 21, 132 (2009) (in German).
41. V. Stranak, S. Drache, R. Bogdanowicz, H. Wulff, A.-P. Herrendorf, Z. Hubicka, M. Cada, M. Tichy, and R. Hippler, Surf. Coat. Technol. 206, 2801 (2012). 10.1016/j.surfcoat.2011.11.043
42. M. Ganciu, S. Konstantinidis, Y. Paint, J. P. Dauchot, M. Hecq, J. Opt. Adv. Mater. 7, 2481 (2005).
43. H. Oechsner, Plasma Phys. 16, 835 (1973).
44. H. Oechsner, Vacuum 83, 727 (2008). 10.1016/j.vacuum.2008.05.018
45. V. Stranak, A.-P. Herrendorf, S. Drache, M. Cada, Z. Hubicka, M. Tichy, and R. Hippler, Appl. Phys. Lett. 100, 141604 (2012). 10.1063/1.3699229
46. P. Awakowicz, R. Schwefel, P. Scheubert, and G. Benstetter, Surf. Coat. Technol. 142-144, 342 (2001). 10.1016/S0257-8972(01)01313-5
47. S. Rodil, N. A. Morrison, W. I. Milne, J. Robertson, V. Stolojan, and D. N. Jayawardane, Diamond Relat. Mater. 9, 524 (2000). 10.1016/S0925-9635(99) 00345-3
48. Z. X. Cao, J. Vac. Sci. Technol. 19 (2), 485 (2001). 10.1116/1.1339007
49. H. Oechsner, M. Scheib, and H. Goebel, Thin Solid Films 341, 101 (1999). 10.1016/S0040-6090(98)01547-8
50. S. Pfau and M. Tichy, Langmuir probe diagnostics., in Low Temperature Plasma Physics, edited by, R. Hippler, H. Kersten, M. Schmidt, and, K.-H. Schoenbach, (Wiley-VCH, Berlin, 2008), p. 175.
51. C. Hayden, D. Gahan, and M. B. Hopkins, Plasma Sources Sci. Technol. 18, 025018 (2009). 10.1088/0963-0252/18/2/025018
52. D. Gahan, B. Dolinaj, and M. B. Hopkins, Rev. Sci. Instrum. 79, 033502 (2008). 10.1063/1.2890100
53. K. Denieffe, C. M. O. Mahonz, P. D. Maguire, D. Gahan, and M. B. Hopkins, J. Phys. D: Appl. Phys. 44, 075205 (2011). 10.1088/0022-3727/44/7/075205
54. Ch. Bohm and J. Perrin, Rev. Sci. Instrum. 61 (1), 31 (1993).
55. T. Baloniak, R. Reuter, Ch. Flotgen, and A. v. Keudell, J. Phys. D: Appl. Phys. 43, 055203 (2010). 10.1088/0022-3727/43/5/055203
56. S. Seeger, K. Harbauer, and K. Ellmer, J. Appl. Phys. 105, 053305 (2009). 10.1063/1.3086618
57. K. Ellmer, R. Wendt, and K. Wisemann, J. Mass. Spectrom. 223-224, 679 (2003). 10.1016/S1387-3806(02)00940-5
58. P. Poolcharuansin and J. W. Bradley, Plasma Sources Sci. Technol. 19, 025010 (2010). 10.1088/0963-0252/19/2/025010
59. J. Bohlmark, U. Helmersson, M. VanZeeland, I. Axnas, J. Alami, and N. Brenning, Plasma Sources. Sci. Technol. 13, 654 (2004). 10.1088/0963-0252/13/4/ 014
60. A. Hecimovic and A. P. Ehiasarian, J. Appl. Phys. 108, 063301 (2010). 10.1063/1.3486018
61. A. P. Ehiasarian, A. Vetushka, A. Hecimovic, and S. Konstantinidis, J. Appl. Phys. 104, 083305 (2008). 10.1063/1.3000446
62. T. Kozak and A. D. Pajdarova, J. Appl. Phys. 110, 103303 (2011). 10.1063/1.3656446
63. J. T. Gudmundsson, P. Sigurjosson, P. Larsson, D. Lundin, and U. Helmersson, J. Appl. Phys. 105, 123302 (2009). 10.1063/1.3151953
64. S. Drache, V. Stranak, A.-P. Herrendorf, M. Cada, Z. Hubicka, M. Tichy, and R. Hippler, Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges., Vacuum (in press).
65. A. Aijaz, K. Sarakinos, D. Lundin, N. Brenning, and U. Helmersson, Diamond Relat. Mater. 23, 1 (2012). 10.1016/j.diamond.2011.12.043
66. A. Rauch, R. J. Mendelsberg, J. M. Sanders, and A. Anders, J. Appl. Phys. 111, 083302 (2012). 10.1063/1.3700242
67. A. Anders, J. Andersson, and A. Ehiasarian, J. Appl. Phys. 102, 113303 (2007). 10.1063/1.2817812
68. A. Hecimovic and A. P. Ehiasarian, J. Phys. D: Appl. Phys. 42, 135209 (2009). 10.1088/0022-3727/42/13/135209
69. M. Misina, L. R. Shaginyan, M. Macek, and P. Panjan, Surf. Coat. Technol. 142, 348 (2001). 10.1016/S0257-8972(01)01071-4