Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

Materials Science and Engineering C

Volumn 31, Issue 7, 2011, Pages 1512-1519

  Stranak, V ^a   Wulff, H ^a   Rebl, H ^b   Zietz, C ^b   Arndt, K ^b   Bogdanowicz, R ^a   Nebe, B ^b   Bader, R ^b   Podbielski, A ^b   Hubicka, Z ^c   Hippler, R ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b UNIVERSITY OF ROSTOCK   (Germany)

^c INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Antimicrobial effect; Human osteoblast growth; Implant coating; Pulsed magnetron sputtering; Titanium copper film

Indexed keywords

ANTI-MICROBIAL EFFECTS; ANTIBACTERIAL EFFECTS; ATOMIC ABSORPTION SPECTROSCOPY; CYTOTOXIC EFFECTS; DEPOSITED FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; DUAL MAGNETRON SPUTTERING; HIGH-POWER; HUMAN OSTEOBLAST; IN-VITRO; JOINT REPLACEMENT; MAGNETRON SPUTTERING METHOD; OSTEOBLASTIC CELLS; PULSED MAGNETRON SPUTTERING; S. AUREUS; STAPHYLOCOCCUS EPIDERMIDIS; TITANIUM-COPPER FILM; X-RAY REFLECTOMETRY;

ABSORPTION SPECTROSCOPY; ATOMIC SPECTROSCOPY; BACTERIA; BACTERIOLOGY; CYTOTOXICITY; DC POWER TRANSMISSION; FILM PREPARATION; JOINT PROSTHESES; MAGNETRON SPUTTERING; METALLIC FILMS; TITANIUM; X RAY DIFFRACTION ANALYSIS;

COPPER;

EID: 80052114718     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2011.06.009     Document Type: Article

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