Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 348-354

  Mišina, Martin ^a   Shaginyan, Leonid R ^b   Maček, Marijan ^c   Panjan, Peter ^d  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^c UNIVERSITY OF LJUBLJANA   (Slovenia)

^d JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

DC; Energy resolved mass spectroscopy; Magnetron; Reactive sputtering; Titanium nitride; Tungsten

Indexed keywords

ARGON; CATHODES; COMPUTER SIMULATION; DENSITY (SPECIFIC GRAVITY); ELECTRIC CURRENTS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; MONTE CARLO METHODS; POSITIVE IONS; PRESSURE EFFECTS; SUBSTRATES; TITANIUM NITRIDE;

ENERGY RESOLVED MASS SPECTROSCOPY;

PLASMA APPLICATIONS;

PLASMA TREATMENT;

EID: 0035387379     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01071-4     Document Type: Article

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