Theoretical background and some applications of ECWR-plasmas

Vacuum

Volumn 83, Issue 4, 2008, Pages 727-731

  Oechsner, Hans ^a  

^a University of Koblenz Landau   (Germany)

Author keywords

Anisotropic electrodynamics; Low pressure RF discharges; Plasma assisted surface and thin film technology

Indexed keywords

CYCLOTRONS; ELECTROMAGNETIC WAVES; ELECTROMAGNETISM; ELECTRON BEAMS; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; ION SOURCES; MASS SPECTROMETRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA WAVES;

ANISOTROPIC ELECTRODYNAMICS; ANISOTROPIC MEDIUM; DISPERSION RELATIONS; ELECTRON CYCLOTRON WAVE RESONANCE; LOW PRESSURE RF DISCHARGES; LOW-PRESSURE PLASMAS; PLASMA ASSISTED SURFACE AND THIN FILM TECHNOLOGY; PLASMA EXCITATIONS; PLASMA REACTORS; SOME APPLICATIONS; SURFACE MASS; TECHNICAL PERFORMANCE;

PLASMAS;

EID: 52949126967     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.05.018     Document Type: Article

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