Plasma "anti-assistance" and "self-assistance" to high power impulse magnetron sputtering

Journal of Applied Physics

Volumn 105, Issue 7, 2009, Pages

  Anders, Andŕ ^a   Yushkov, Georgy Yu ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AFTERGLOW PLASMAS; ASSISTANCE SYSTEMS; FREQUENCY REGIONS; GAS PRESSURES; GAS-PLASMA FLOWS; GROWTH PROCESS; HIGH PULSE REPETITION RATES; HIGH-POWER; LOWER PRESSURES; MAGNETRON DISCHARGES; PULSE REPETITION RATES; PULSED SPUTTERING;

DC GENERATORS; FILM GROWTH; MAGNETRONS; PLASMAS;

ELECTRIC DISCHARGES;

EID: 65249108645     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3097390     Document Type: Article

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