Deposition of carbon nitride films using an electron cyclotron wave resonance plasma source

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 524-529

  Rodil, S ^a   Morrison, N A ^a   Milne, W I ^a   Robertson, J ^a   Stolojan, V ^b   Jayawardane, D N ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; ELECTRIC PROPERTIES; ELECTRON CYCLOTRON RESONANCE; ENERGY GAP; HYDROGENATION; MOLECULAR STRUCTURE; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SYNTHESIS (CHEMICAL);

CARBON NITRIDE; ELECTRON CYCLOTRON WAVE RESONANCE (ECWR) TECHNIQUE;

CARBON INORGANIC COMPOUNDS;

EID: 0033728806     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00345-3     Document Type: Article

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