On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 42, Issue 11, 2009, Pages

  Alami, J ^a   Sarakinos, K ^b   Uslu, F ^b   Klever, C ^b   Dukwen, J ^b   Wuttig, M ^b  

^a Sulzer Metaplas GmbH   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATRICES; DEPOSITION CONDITIONS; GROWING FILMS; HIGH POWER PULSED MAGNETRON SPUTTERING; PHASE FORMATIONS; RUTILE FILMS; TARGET SURFACE; TIO; WORKING PRESSURES;

MAGNETRONS; OXIDE FILMS; OXIDE MINERALS; SUBSTRATES; TARGETS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

AMORPHOUS FILMS;

EID: 70349135551     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/11/115204     Document Type: Article

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