Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode

Review of Scientific Instruments

Volumn 79, Issue 3, 2008, Pages

  Gahan, D ^a   Dolinaj, B ^a   Hopkins, M B ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA DIAGNOSTICS; PRESSURE EFFECTS; PUMPING (LASER);

FIELD ANALYZERS; ION ENERGY DISTRIBUTION; PLASMA DISCHARGES; WAVEFORMS;

ELECTRODES;

EID: 41549090909     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2890100     Document Type: Article

References (34)

1. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, J. Appl. Phys. 69, 3455 (1991).
2. M. A. Sobolewski, Appl. Phys. Lett. 70, 1049 (1997).
3. M. A. Sobolewski, Appl. Phys. Lett. 72, 1146 (1998).
4. J. W. Coburn and E. Kay, J. Appl. Phys. 43, 4965 (1972).
5. K. Kohler, J. W. Coburn, D. E. Horne, E. Kay, and J. H. Keller, J. Appl. Phys. 57, 59 (1985).
6. S. G. Ingram and N. S. J. Braithwaite, J. Phys. D 21, 1496 (1988).
7. A. D. Kuypers and H. J. Hopman, J. Appl. Phys. 63, 1894 (1988).
8. J. W. Coburn, Thin Solid Films 171, 65 (1989).
9. A. D. Kuypers and H. J. Hopman, J. Appl. Phys. 67, 1229 (1990).
10. S. G. Ingram and N. S. J. Braithwaite, J. Appl. Phys. 68, 5519 (1990).
11. W. M. Holber and J. Forster, J. Vac. Sci. Technol. A 8, 3720 (1990).
12. J. Janes and C. Huth, Appl. Phys. Lett. 61, 261 (1992).
13. J. Janes and C. Huth, J. Vac. Sci. Technol. A 10, 3086 (1992).
14. C. Charles, R. W. Boswell, and R. K. Porteous, J. Vac. Sci. Technol. A 10, 398 (1992).
15. C. Charles, J. Vac. Sci. Technol. A 11, 157 (1993).
16. C. Bohm and J. Perrin, Rev. Sci. Instrum. 64, 31 (1993).
17. J. R. Woodworth, M. E. Riley, D. C. Meister, B. P. Aragon, M. S. Le, and H. H. Sawin, J. Appl. Phys. 80, 1304 (1996).
18. J. R. Woodworth, B. P. Aragon, and T. W. Hamilton, Appl. Phys. Lett. 70, 1947 (1997).
19. J. R. Woodworth, M. E. Riley, P. A. Miller, G. A. Hebner, and T. W. Hamilton, J. Appl. Phys. 81, 5950 (1997).
20. J. R. Woodworth, M. E. Riley, P. A. Miller, C. A. Nichols, and T. W. Hamilton, J. Vac. Sci. Technol. A 15, 1 (1997).
21. E. A. Edelberg, A. J. Perry, N. Benjamin, and E. S. Aydil, Rev. Sci. Instrum. 70, 2689 (1999).
22. J. R. Woodworth, I. C. Abraham, M. E. Riley, P. A. Miller, T. W. Hamilton, B. P. Aragon, R. J. Shul, and C. G. Wilson, J. Vac. Sci. Technol. A 20, 873 (2002).
23. www.impedans.com
24. M. B. Hopkins, J. Res. Natl. Inst. Stand. Technol. 100, 415 (1995).
25. F. Soberón, Ph.D. thesis, Dublin City University, 2005.
26. D. Gahan and M. B. Hopkins, J. Appl. Phys. 100, 043304 (2006).
27. D. Gahan and F. Soberón, J. Appl. Phys. 101, 023303 (2007).
28. D. Gahan and M. B. Hopkins, Rev. Sci. Instrum. 78, 016102 (2007).
29. P. Benoit-Cattin and L. C. Bernard, J. Appl. Phys. 39, 5273 (1968).
30. M. G. Blain, J. E. Stevens, and J. R. Woodworth, Appl. Phys. Lett. 75, 3923 (1999).
31. E. Kawamura, V. Vahedi, M. A. Lieberman, and C. K. Birdsall, Plasma Sources Sci. Technol. 8, R45 (1999).
32. R. T. C. Tsui, Phys. Rev. 168, 107 (1968).
33. Z. Kiss'ovski, S. Kolev, A. Shivarova, and T. Tsankov, IEEE Trans. Plasma Sci. 35, 1149 (2007).
34. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharge and Materials Processing (Wiley, New Yok, 1994).