Ion-energy distributions at a substrate in reactive magnetron sputtering discharges in Ar/ H2S from copper, indium, and tungsten targets

Journal of Applied Physics

Volumn 105, Issue 5, 2009, Pages

  Seeger, S ^a   Harbauer, K ^a   Ellmer, K ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL COMPOUNDS; CHEMICAL REACTIVITY; COPPER; ELECTRIC DISCHARGES; ELECTRIC POWER DISTRIBUTION; HYDROGEN; HYDROGEN SULFIDE; INDIUM; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MAGNETRONS; MASS SPECTROMETRY; NEGATIVE IONS; PLASMAS; SEMICONDUCTING FILMS; SUBSTRATES; SULFUR; SULFUR DETERMINATION; TARGETS; TUNGSTEN; TUNGSTEN COMPOUNDS;

ABSORBER LAYERS; CATHODE DARK SPACES; CHARGE-EXCHANGE COLLISIONS; CHARGE-EXCHANGE CROSS SECTIONS; DC DISCHARGES; DISCHARGE VOLTAGES; ENERGETIC SPECIES; ENERGY DIFFERENCES; ENERGY DISTRIBUTIONS; FLOATING POTENTIALS; HIGH ENERGIES; LOWER ENERGIES; MASS SPECTRUM; METALLIC IONS; METALLIC TARGETS; PHOTOVOLTAIC APPLICATIONS; PLASMA EXCITATIONS; REACTIVE MAGNETRON SPUTTERING; RF DISCHARGES; RF- MAGNETRON SPUTTERING; SEMICONDUCTING SULFIDES; SULFUR IONS;

TIN;

EID: 62549114060     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3086618     Document Type: Article

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