Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: Geometrical transparency and collisional effects

Journal of Physics D: Applied Physics

Volumn 43, Issue 5, 2010, Pages

  Baloniak, Tim ^a   Reuter, Rüdiger ^a   Flötgen, Christoph ^a   Von Keudell, Achim ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL MODEL; COLLISIONAL EFFECTS; ION CURRENTS; ION VELOCITY DISTRIBUTION; IONS IMPINGING; LOW TEMPERATURE PLASMAS; PLASMA REACTORS; SIMPLE METHOD;

CALIBRATION; HIGH ENERGY PHYSICS; IONS; PLASMA DIAGNOSTICS; RANDOM PROCESSES; RANDOM VARIABLES; TRANSPARENCY;

COLLISIONAL PLASMAS;

EID: 76649139468     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/5/055203     Document Type: Article

References (25)

1. Patterson M M, Chu H-Y and Wendt A E 2007 Arbitray substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing Plasma Sources Sci. Technol. 16 257
2. 2/Si fluorocarbon plasma etch selectivity J. Vac. Sci. Technol. A 19 2425
3. Silapunt R, Wendt A E and Kirmse K H R 2007 Ion energy control at substrates during plasma eching of patterned structures J. Vac. Sci. Technol. B 25 1882
4. Buzzi F L, Ting Y-H and Wendt A E 2009 Energy distribution of bombarding ions in plasma etching of dielectrics Plasma Sources Sci. Technol. 18 025009
5. Yamada-Takamura Y, Koch F, Maier H and Bolt H 2001 Charaterization of α-phase aluminum oxide films deposited by filtered vacuum arc Surf. Coat. Technol. 142-144 260-4
6. Audronis M, Matthews A and Leyland A 2008 Pulsed-bias magnetron sputtering of non-conductive crystalline chromia films at low substrate temperature J. Phys. D.: Appl. Phys. 41 035309
7. + ions at the radio-frequency-powered electrode in reactive ion etching J. Vac. Sci. Technol. A 10 3086-91
8. Abraham I C, Woodworth J R, Riley M E, Miller P A, Hamilton T W and Aragon B P 2002 Ion energy distributions versus frequency and ion mass at the rf-biased electrode in an inductively driven discharge J. Vac. Sci. Technol. 20 1759
9. Woodworth J R, Abraham I C, Riley M E, Miller P A, Hamilton T W, Aragon B P, Shul R J and Willison C G 2002 Ion energy distribution at rf-biased wafer surfaces J. Vac. Sci. Technol. A 20 873-86
10. Kratzer M, Brinkmann R P, Sabisch W and Schmidt H 2001 Hybrid model for the calculation of ion distribution functions behind a direct current or radio frequency driven plasma boundary sheath J. Appl. Phys. 90 2169-79
11. Agarwal A and Kushner M J 2005 Effect of nonsinusoidal bias waveforms on ion energy distributions and fluorocarbon plasma etch selectivity J. Vac. Sci. Technol. A 23 1440-9
12. Edelberg E A and Aydil E S 1999 Modeling of the sheath and the energy distribution of ions bombarding rf-biased substrates in high density plasma reactors and comparsion to experimental measurements J. Appl. Phys. 86 4799
13. Rauf S 2000 Effect of bias voltage waveform on ion energy distribution J. Appl. Phys. 87 7647-51
14. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2 edn (New York: Wiley)
15. Kuypers A D and Hopman H J 1988 Ion energy measurement at the powered electrode in an rf discharge J. Appl. Phys. 63 1894
16. Manenschijn A, Janssen G C A M, van der Drift E and Radelaar S 1991 Measurement of ion impact energy and ion flux at the rf electrode of a parellel plate reactive ion etcher J. Appl. Phys. 69 1253-62
17. Edelberg E A, Perry A, Benjamin N and Aydil E S 1999 Compact floating ion energy analyzer for measuring energy distributions of ions bombarding radio-frequency biased electrode surfaces Rev. Sci. Instrum. 70 2689-98
18. Barnat E V and Lu T-M 2002 Measured energy distributions of ions driven by an asymmetrically pulsed bias during magnetron sputtering J. Appl. Phys. 92 2984-9
19. Gahan D, Dolinaj B and Hopkins M B 2008 Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode Rev. Sci. Instrum. 79 033502
20. Böhm C and Perrin J 1993 Retarding-field analyzer for measurements of ion energy distributions and secondary electron emission coefficients in low-pressure radio frequency discharges Rev. Sci. Instrum. 64 31
21. Conway G D, Perry A J and Boswell R W 1998 Evolution of ion and electron energy distributions in pulsed helicon plasma discharges Plasma Sources Sci. Technol. 7 337-47
22. Blain M G, Stevens J E and Woodworth J R 1999 High-resolution submicron retarding field analyzer for low-temperature plasma analysis Appl. Phys. Lett. 75 3923-5
23. Scheubert P, Fantz U, Awakowicz P and Paulin H 2001 Experimental and theoretical characterization of an inductively coupled plasma source J. Appl. Phys. 90 587-98
24. Davis W D and Vanderslice T A 1963 Ion energies at the cathode of a glow discharge Phys. Rev. 131 219-30
25. Edelberg E, Perry A, Benjamin N and Aydil E 1999 Energy distribution of ions bombarding biased electrodes in high density plasma reactors J. Vac. Sci. Technol. A 17 506