ECWR-plasma CVD as a novel technique for phase controlled deposition of semiconductor films

Thin Solid Films

Volumn 341, Issue 1, 1999, Pages 101-104

  Oechsner, H ^a   Scheib, M ^a   Goebel, H ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ELECTRON CYCLOTRON RESONANCE; NANOSTRUCTURED MATERIALS; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS;

HYDROGENATED FILMS; PHASE CONTROLLED DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0032678794     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01547-8     Document Type: Article

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