SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 100, Issue 14, 2012, Pages

Highly ionized physical vapor deposition plasma source working at very low pressure

(7) Stranak, V a Herrendorf, A P a Drache, S a Cada, M b Hubicka, Z b Tichy, M c Hippler, R a

a UNIVERSITY OF GREIFSWALD (Germany)

b INSTITUTE OF PHYSICS (Czech Republic)

c CHARLES UNIVERSITY (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON WAVE RESONANCES; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIGHLY-IONIZED; LOW PRESSURES; PRE-IONIZATION; PRESSURE RANGES; RF ELECTRODES; SPUTTERED PARTICLES;

IONIZATION; PLASMA DENSITY;

VAPORS;

EID: 84859798488 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3699229 Document Type: Article

Times cited : (36)

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