Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 43, Issue 28, 2010, Pages

  Stranak, Vitezslav ^a,b   Quaas, Marion ^a,c   Bogdanowicz, Robert ^d   Steffen, Hartmut ^c   Wulff, Harm ^a   Hubicka, Zdenek ^b   Tichy, Milan ^e   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^d GDANSK UNIVERSITY OF TECHNOLOGY   (Poland)

^e CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; DEPOSITION PROCESS; DISCHARGE PROPERTIES; FLOATING POTENTIALS; HIGH-POWER; IN-BAND; LOW FLOW; NITROGEN-DOPING; O-LATTICE; PEAK DISCHARGE; POST-DEPOSITION; PULSED MAGNETRON SPUTTERING; REACTIVE GAS; REPETITION FREQUENCY; ROOM TEMPERATURE; SPECTRAL LINE; THERMAL-ANNEALING; THIN FILM FORMATION; TIME EVOLUTIONS; TIME RESOLVED OPTICAL EMISSION SPECTROSCOPY; TIO; XRD;

DIAMOND FILMS; EMISSION SPECTROSCOPY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXYGEN; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL EMISSION SPECTROSCOPY;

EID: 77954379136     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/28/285203     Document Type: Article

References (72)

1. Fujishima A and Honda K 1972 Nature 238 37
2. Finazzi E, Valentin C, Selloni A and Pacchioni G 2007 J. Phys. Chem. C 111 9275
3. Klosek S and Raftery D 2001 J. Phys. Chem. B 105 2815
4. Choi W, Termin A and Hofmann M R 1994 J. Phys. Chem. 98 13669
5. Ghos A K and Maruska H P 1977 J. Electrochem. Soc. 124 1516
6. Zakrzewska K, Radecka M, Kruk A and Osuch W 2003 Thin Solid Films 157 349
7. Gole J L, Stout J D, Burda C, Lou Y and Chen X 2004 J. Phys. Chem. B 108 1230
8. Diwald O, Thomson T L, Zubkov T, Goralskin E G, Walck S D and Yates J T 2004 J. Phys. Chem. B 108 6004
9. Asahi R, Morikawa T, Ohwaki T, Aoki K and Taga Y 2001 Science 293 269
10. Lindgren T et al 2003 J. Phys. Chem. B 107 5709
11. Lettmann C, Hildenbrand K, Kish H, Macyk W and Maier W F 2001 Appl. Catal. B 32 215
12. Umebayashi T, Yamaki T, Itoh H and Asai K 2002 Appl. Phys. Lett. 81 454
13. Yu J C, Yu J G, Ho W K, Jiang Y T and Yhang L Y 2002 Chem. Mater 14 3808
14. Morikawa T, Asahi R, Ohwaki T, Aoki K and Taga Y 2001 Japan. J. Appl. Phys. 40/6A L561
15. Farkas B, Budai J, Kabalci I, Heszler P and Geretovszky Zs 2008 Appl. Surf. Sci. 254 3484
16. Zhao L, Jiang Q and Lian J 2008 Appl. Surf. Sci. 254 4620
17. Park J, Lee J-Y and Cho J-H 2006 J. Appl. Phys. 100 113534
18. Gartner M et al 2008 Thin Solid Films 516 8184
19. Trapalis C, Giannakopoulou T, Todorova N, Anastasescu C, Anastasescu M and Gartner M 2007 CAS 2007, Proc. Int. Semiconductor Conf. vol 1 and 2 (Piscataway, NJ: IEEE) pp 303-6
20. Martínez-Ferrero E et al 2007 Adv. Funct. Matter 17 3348
21. Wu P G, Ma C H and Shang J K 2005 Appl. Phys. A 81 1411
22. Yang M C, Yang T S and Wong M S 2004 Thin Solid Films 469 1
23. Park S-W and Heo J-E 2007 Sep. Purifi. Technol. 58 200
24. Chiu S-M, Chen Y-S, Yang K-Y, Hsu Y-L and Gan D 2007 J. Mater. Process. Technol. 192 60
25. Mohamed S H et al 2004 Phys. Status Solidi a 201 90
26. Mohamed S H, Kapperty O, Niemeier T, Drese R, Wakkad M M and Wuttig M 2004 Thin Solid Films 201 90
27. Chappe J-M et al 2004 Appl. Surf. Sci. 225 29
28. Li Q and Shang J K 2008 J. Am. Ceram. Soc. 9 3167
29. Martin N et al 2007 Surf. Coat. Technol. 201 7720
30. Chappe J-M et al 2007 Appl. Surf. Sci. 253 5312
31. Martin N et al 2007 Surf. Coat. Technol. 201 7753
32. He G, Yhang L D, Li G H, Liu M and Wang X J 2008 J. Phys. D: Appl. Phys. 41 045304
33. Balaceanu M et al 2008 Surf. Coat. Technol. 208 2384
34. Herman D, Sicha J and Musil J 2006 Vacuum 81 285
35. Schiller S, Godicke K, Reschke J, Kirchhoff V, Schneider S and Milde F 1993 Surf. Coat. Technol. 61 331
36. Bradley J W and Welzel T 2009 J. Phys. D: Appl. Phys. 42 093001
37. Kouznetsov V, Macak K, Schneider J M, Helmersson U and Petrov I 2006 Surf. Coat. Technol. 122 293
38. Gudmundsson J T, Alami J and Helmersson U 2001 Appl. Phys. Lett. 78 3427
39. Helmersson U, Lattemann M, Blohmark J, Ehiasarian A P and Gudmundsson J T 2006 Thin Solid Films 513 1
40. Bohlmark J et al 1997 Thin Solid Films 300 1522
41. Vetushka A and Ehiasarian A P 2008 J. Phys. D: Appl. Phys. 41 015204
42. Stranak V, Quaas M, Wulff H, Hubicka Z, Wrehde S, Tichy M and Hippler R 2008 J. Phys. D: Appl. Phys. 41 055202
43. Stranak V et al 2009 J. Phys. D: Appl. Phys. 42 105204
44. Alami J, Sarakinos K, Uslu F, Klever C, Dukwen J and Wuttig M 2009 J. Phys. D: Appl. Phys. 42 115204
45. Stranak V et al 2006 Surf. Coat. Technol. 201 2512
46. Musil J, Herman D and Sicha J 2006 J. Vac. Sci. Technol. A 24/3 521
47. Navratil Z, Trunec D, Smid R and Lazar L 2006 Czech. J. Phys. 56/B B944
48. Wulff H and Steffen H 2008 Characterisation of thin films Low Temperature Plasma Physics ed R Hippler et al (Berlin: Wiley-VCH) p 329
49. Powder Diffraction File, Joint Committee on Powder Diffraction- International Centre for Diffraction Data (NIST)
50. Palik E D 1985 Handbook of Optical Constants of Solids (New York: Academic)
51. Tomkins H G 1999 Spectroscopic Ellipsometry and Reflectometry (New York: Wiley)
52. Wang Z, Cohen S A, Ruzic D N and Goeckner M J 2000 Phys. Rev. E 61/2 1904
53. Tao K, Mao D and Hopwood J J. Appl. Phys. 91 4040
54. Ricard A 1996 Reactive Plasma (Paris: Sociate Francaise du Vide)
55. Gordiets B and Ricard A 1993 Plasma Sources Sci. Technol. 2 158
56. Kudrle V, Vasina P, Talsky A and Janca J 2002 Czech. J. Phys. 52 589
57. Pipa A V, Bindemann T, Foest R, Kindel E, Roepcke J and Weltmann K-D 2008 J. Phys. D: Appl. Phys. 41 194011
58. Depla D, Heirwegh S, Mahieu S and De Gryse R 2007 J. Appl. Phys. 101 13301
59. Bohlmark J et al 2006 Thin Solid Films 515 1522
60. Ranjan R, Allain J P, Hendricks M R and Ruzic D N 2001 J. Vac. Sci. Technol. A 19/3 1004
61. Audronis M and Bellido-Gonzales V 2010 Thin Solid Films 518 1962
62. Audronis M, Bellido-Gonzales V and Daniel B 2010 Surf. Coat. Technol. 204/14 2159-64
63. Wallin E and Helmersson U 2008 Thin Solid Films 516 6398
64. Martin N, Baretti D, Rousselot C and Rauch J-Y 1998 Surf. Coat. Technol. 107 172
65. Holmberg B 1962 Acta Chem. Scand. 16 1255
66. Chorn-Cherng J, Goto T and Hirai T 1993 J. Alloys Compounds 190 197
67. Etchessahar E, Bars J P and Debuigne J 1987 J. Less-Common Met. 134 123
68. Kersten H, Wagner H-E, Wulff H and Eggs C 1996 Thin Solid Films 290-291 381
69. Fujishima A, Zhang X and Tryk D A 2008 Surf. Sci. Rep. 63 515
70. Moss T S 1950 Proc. Phys. Soc. B 63 167
71. Reddy R R and Nazeer Ahammed Y 1995 Infrared Phys. Technol. 36 825
72. Futsuhara M, Yoshioka K and Takai O 1998 Thin Solid Films 171 322