Ion energy distributions at a capacitively and directly coupled electrode immersed in a plasma generated by a remote source

Plasma Sources Science and Technology

Volumn 18, Issue 2, 2009, Pages

  Hayden, C ^a   Gahan, D ^a   Hopkins, M B ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS FREQUENCY; DIRECT COUPLING; DISCHARGE PRESSURES; DOUBLE LAYERS; ENERGY DISTRIBUTIONS; FIELD ENERGY; INDUCTIVELY-COUPLED; ION ENERGY DISTRIBUTIONS; ION FLUXES; LOW PRESSURES; RADIO FREQUENCY DISCHARGES; REMOTE RF; RF BIAS; SOURCE CHARACTERIZATION;

ELECTRIC POWER DISTRIBUTION; HELIUM; INDUCTIVELY COUPLED PLASMA; IONS; PLASMA SHEATHS; PLASMA SOURCES;

ELECTRIC DISCHARGES;

EID: 67649838446     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/2/025018     Document Type: Article

References (40)

1. Greene W M, Hartley M A and Hess D W 1988 J. Appl. Phys. 63 1367
2. Simpson J A 1961 Rev. Sci. Instrum. 32 1283
3. Coburn J W and Kay E 1972 J. Appl. Phys. 43 4965
4. Köhler K, Coburn J W, Horne D E, Kay E and Keller J H 1985 J. Appl. Phys. 59 1
5. Köhler K, Horne D E and Coburn J W 1985 J. Appl. Phys. 58 9
6. Kuypers A D and Hopman H J 1988 J. Appl. Phys. 63 1894
7. Ingram S G and Braithwaite N S J 1988 J. Phys. D: Appl. Phys. 21 1496
8. Ingram S G and Braithwaite N S J 1990 J. Appl. Phys. 68 5519
9. Kuypers A D and Hopman H J 1990 J. Appl. Phys. 67 1229
10. Liu J, Huppert G L and Sawin H H 1990 J. Appl. Phys. 68 3916
11. Woodworth J R, Riley M E, Meister D C, Aragon B P, Le M S and Sawin H H 1996 J. Appl. Phys. 80 1304
12. Woodworth J R, Aragon B P and Hamilton T W 1997 Appl. Phys. Lett. 70 1947
13. Woodworth J R, Riley M E, Miller P A, Hebner G A and Hamilton T W 1997 J. Appl. Phys. 81 5950
14. Woodworth J R, Riley M E, Miller P A, Nichols C A and Hamilton T W 1997 J. Vac. Sci. Technol. A 15 3015
15. Woodworth J R, Abraham I C, Riley M E, Miller P A, Hamilton T W, Aragon B P, Shul R J and Wilson C G 2002 J. Vac. Sci. Technol. A 20 873
16. Edelberg E A, Perry A J, Benjamin N and Aydil E S 1999 J. Vac. Sci. Technol. A 17 506
17. Edelberg E A, Perry A J, Benjamin N and Aydil E S 1999 Rev. Sci. Instrum. 70 2689
18. Edelberg E A and Aydil E S 1999 J. Appl. Phys. 86 4799
19. Kawamura E, Vahedi V, Lieberman M A and Birdsall C K 1999 Plasma Sources Sci. Technol. 8 R45
20. Gahan D, Dolinaj B and Hopkins M B 2008 Rev. Sci. Instrum. 79 033502
21. Zou Y, Cui Y, Yun V, Valfells A, Kishek R A, Bernal S, Haber I, Reiser M, O'Shea P G and Wang J G 2002 Phys. Rev. ST Accel. Beams 5 072801
22. Séran E 2003 Ann. Geophys. 21 1159
23. Charles C 2007 Plasma Sources Sci. Technol. 16 R1
24. Plihon N, Corr C S and Chabert P 2005 Appl. Phys. Lett. 86 091501
25. Lieberman M A, Charles C and Boswell R W 2006 J. Phys. D: Appl. Phys. 39 3294
26. Meige A, Plihon N, Hagelaar G J M, Boeuf J-P, Chabert P and Boswell R W 2007 Phys. Plasmas. 14 053508
27. Benoit-Cattin P and Bernard L C 1968 J. Appl. Phys. 39 5723
28. Soberón F 2005 PhD Thesis Dublin City University
29. Gahan D and Hopkins M B 2006 J. Appl. Phys. 100 043304
30. Gahan D and Soberón F 2007 J. Appl. Phys. 101 023303
31. Gahan D and Hopkins M B 2007 Rev. Sci. Instrum. 78 016102
32. www.impedans.com
33. Gahan D, Dolinaj B and Hopkins M B 2008 Plasma Sources Sci. Technol. 17 035026
34. Scanlan J V and Hopkins M B 1992 J. Vac. Sci. Technol. A 10 1207
35. Hopkins M B 1995 J. Res. Natl Inst. Stand. Technol. 100 415
36. Dimitrova M, Djermanova N, Kissovski Z, Kolev S, Shivarova A and Tsankov T 2006 Plasma Process. Polym. 3 156-9
37. Lieberman M A and Lichtenberg A J 2004 Principles of Plasma Discharge and Materials Processing (New York: Wiley)
38. Sobolewski M A and Kim J-H 2007 J. Appl. Phys. 102 113302
39. Sobolewski M A, Wang Y and Goyette A 2002 J. Appl. Phys. 91 6303
40. Charles C, Degeling A W, Sheridan T E, Harris J H, Lieberman M A and Boswell R W 2000 Phys. Plasmas 7 5232