Deposition of a-C:H films with an ECWR-reactor at 27 MHz: Plasma diagnostics and film properties

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 342-347

  Awakowicz, P ^a   Schwefel, R ^a   Scheubert, P ^a   Benstetter, G ^b  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b DEGGENDORF INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Deposition; ECWR reactor; Film properties; Plasma diagnostics

Indexed keywords

DENSITY (SPECIFIC GRAVITY); DEPOSITION; ELECTRON CYCLOTRON RESONANCE; HYDROCARBONS; LANGMUIR BLODGETT FILMS; MASS SPECTROMETRY; PLASMA DIAGNOSTICS;

ENERGY MASS SPECTROMETRY (EMS);

THIN FILMS;

FILM;

EID: 0035387588     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01313-5     Document Type: Article

References (19)

1. Diamond and diamond-like films and coatings