Area selective atomic layer deposition by microcontact printing with a water-soluble polymer

Journal of the Electrochemical Society

Volumn 157, Issue 12, 2010, Pages

  Mullings, Marja N ^a   Lee, Han Bo Ram ^a   Marchack, Nathan ^a   Jiang, Xirong ^a   Chen, Zhebo ^a   Gorlin, Yelena ^a   Lin, Kuang Po ^a   Bent, Stacey F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AREA SELECTIVE; COATED SURFACE; FREE REGION; HIGH SPATIAL RESOLUTION; MICRO CONTACT PRINTING; PATTERN TRANSFERS; PATTERNED FILMS; REMOVAL PROCESS; SCANNING AUGER ELECTRON SPECTROSCOPIES; WATERSOLUBLE POLYMERS;

ATOMIC LAYER DEPOSITION; AUGER ELECTRON SPECTROSCOPY; ELECTRON DEVICE MANUFACTURE; PLASTIC COATINGS; PLATINUM; POLYMER FILMS; POLYMERS; PRINTING; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILICON OXIDES;

FILM GROWTH;

EID: 78449275474     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3491376     Document Type: Article

References (37)

1. S. M. George, A. W. Ott, and J. W. Klaus, J. Phys. Chem. JPCHAX 0022-3654, 100, 13121 (1996). 10.1021/jp9536763
2. H. Kim, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 21, 2231 (2003). 10.1116/1.1622676
3. H. Kim, H. -B.-R. Lee, and W. J. Maeng, Thin Solid Films THSFAP 0040-6090, 517, 2563 (2009). 10.1016/j.tsf.2008.09.007
4. X. R. Jiang and S. F. Bent, J. Phys. Chem. C JPCCCK 1932-7447, 113, 17613 (2009). 10.1021/jp905317n
5. M. H. Park, Y. J. Jang, H. M. Sung-Suh, and M. M. Sung, Langmuir LANGD5 0743-7463, 20, 2257 (2004). 10.1021/la035760c
6. C. Bae, H. Shin, J. Moon, and M. M. Sung, Chem. Mater. CMATEX 0897-4756, 18, 1085 (2006). 10.1021/cm052084m
7. C. Bae, J. Moon, H. Shin, J. Kim, and M. M. Sung, J. Am. Chem. Soc. JACSAT 0002-7863, 129, 14232 (2007). 10.1021/ja073043p
8. R. Chen and S. F. Bent, Adv. Mater. ADVMEW 0935-9648, 18, 1086 (2006). 10.1002/adma.200502470
9. R. Chen, H. Kim, P. C. McIntyre, and S. F. Bent, Chem. Mater. CMATEX 0897-4756, 17, 536 (2005). 10.1021/cm0486666
10. R. Chen, H. Kim, P. C. McIntyre, D. W. Porter, and S. F. Bent, Appl. Phys. Lett. APPLAB 0003-6951, 86, 191910 (2005). 10.1063/1.1922076
11. X. R. Jiang, R. Chen, and S. F. Bent, Surf. Coat. Technol. SCTEEJ 0257-8972, 201, 8799 (2007). 10.1016/j.surfcoat.2007.04.126
12. J. Hong, D. W. Porter, R. Sreenivasan, P. C. McIntyre, and S. F. Bent, Langmuir LANGD5 0743-7463, 23, 1160 (2007). 10.1021/la0606401
13. X. Jiang and S. F. Bent, J. Electrochem. Soc. JESOAN 0013-4651, 154, D648 (2007). 10.1149/1.2789301
14. X. Jiang, H. Huang, F. B. Prinz, and S. F. Bent, Chem. Mater. CMATEX 0897-4756, 20, 3897 (2008). 10.1021/cm7033189
15. E. Färm, M. Kernell, M. Ritala, and M. Leskela, Chem. Vap. Deposition CVDEFX 0948-1907, 12, 415 (2006). 10.1002/cvde.200604219
16. R. Chen and S. F. Bent, Chem. Mater. CMATEX 0897-4756, 18, 3733 (2006). 10.1021/cm0607785
17. J. P. Lee and M. M. Sung, J. Am. Chem. Soc. JACSAT 0002-7863, 126, 28 (2004). 10.1021/ja038769+
18. H. B. R. Lee, W. H. Kim, J. W. Lee, J. M. Kim, K. Heo, I. C. Hwang, Y. Park, S. Hong, and H. Kim, J. Electrochem. Soc. JESOAN 0013-4651, 157, D10 (2010). 10.1149/1.3248002
19. W. R. Childs and R. G. Nuzzo, Adv. Mater. ADVMEW 0935-9648 16, 1323 (2004). 10.1002/adma.200400592
20. O. Lima, L. Tan, A. Goel, M. Negahban, and Z. Li, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 25, 2412 (2007). 10.1116/1.2804428
21. R. H. A. Ras, E. Sahramo, J. Malm, J. Raula, and M. Karppinen, J. Am. Chem. Soc. JACSAT 0002-7863, 130, 11252 (2008). 10.1021/ja803471g
22. E. Färm, M. Kemell, M. Ritala, and M. Leskelä, J. Phys. Chem. C JPCCCK 1932-7447, 112, 15791 (2008). 10.1021/jp803872s
23. A. Sinha, D. W. Hess, and C. L. Henderson, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 24, 2523 (2006). 10.1116/1.2359728
24. A. Sinha, D. W. Hess, and C. L. Henderson, J. Electrochem. Soc. JESOAN 0013-4651, 153, G465 (2006). 10.1149/1.2184068
25. A. Sinha, D. W. Hess, and C. L. Henderson, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 25, 1721 (2007). 10.1116/1.2782546
26. Y. M. Hua, W. P. King, and C. L. Henderson, Microelectron. Eng. MIENEF 0167-9317, 85, 934 (2008). 10.1016/j.mee.2008.01.105
27. M. J. Biercuk, D. J. Monsma, C. M. Marcus, J. S. Becker, and R. G. Gordon, Appl. Phys. Lett. APPLAB 0003-6951, 83, 2405 (2003). 10.1063/1.1612904
28. E. Färm, M. Kemell, E. Santala, M. Ritala, and M. Leskela, J. Electrochem. Soc. JESOAN 0013-4651, 157, K10 (2010). 10.1149/1.3250936
29. A. Sinha, D. W. Hess, and C. L. Henderson, Electrochem. Solid-State Lett. ESLEF6 1099-0062, 9, G330 (2006). 10.1149/1.2335939
30. M. Kutz, Handbook of Materials Selection, John Wiley & Sons, New York (2002). 10.1002/9780470172551
31. I. C. McNeill and M. Zulfiqar, J. Polym. Sci., Polym. Chem. Ed. JPLCAT 0449-296X, 16, 2465 (1978). 10.1002/pol.1978.170161006
32. R. E. Jones and S. B. Desu, MRS Bull. MRSBEA 0883-7694, 21, 55 (1996).
33. J. L. Gland, B. A. Sexton, and G. B. Fisher, Surf. Sci. SUSCAS 0039-6028, 95, 587 (1980). 10.1016/0039-6028(80)90197-1
34. N. L. Jeon, W. Lin, M. K. Erhardt, G. S. Girolami, and R. G. Nuzzo, Langmuir LANGD5 0743-7463, 13, 3833 (1997). 10.1021/la970167e
35. B. Michel, A. Bernard, A. Bietsch, E. Delamarche, M. Geissler, D. Juncker, H. Kind, J. P. Renault, H. Rothuizen, H. Schmid, IBM J. Res. Dev. IBMJAE 0018-8646, 45, 697 (2001). 10.1147/rd.455.0697
36. C. Wagner, W. Riggs, L. Davis, J. Moulder, and G. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Eden Prairie, MN (1979).
37. M. R. Alexander and F. R. Jones, Carbon CRBNAH 0008-6223, 32, 785 (1994). 10.1016/0008-6223(94)90034-5