Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heated AFM cantilever probe lithography

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 934-936

  Hua, Yueming ^a   King, William P ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Area selective; Atomic force microscope (AFM); Atomic layer deposition (ALD); Heated cantilever

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; DEPOSITION; TITANIUM OXIDES;

HEATED CANTILEVERS; NANOPATTERNING MATERIALS; THERMOCHEMICAL SURFACE MODIFICATION;

LITHOGRAPHY;

EID: 44149092898     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.105     Document Type: Article

References (11)

1. Hua Y., Saxena S., Henderson C.L., and King W.P. J. Micro/Nanolithogr. MEMS MOEMS 6 (2007) 023012
2. Sinha A., Hess D.W., and Henderson C.L. J. Electrochem. Soc. 153 5 (2006) G465
3. Sunden E.O., Wright T.L., Lee J., Graham S.A., and King W.P. Appl. Phys. Lett. 88 (2006) 033107
4. Vettiger P., Cross G., Despont M., Drechsler U., Duerig U., Gotsmann B., Haberle W., Lantz M., Rothuizen H., Stutz R., and Binnig G. IEEE Trans. Nanotechnol. 1 (2002) 39
5. Nelson B.A., King W.P., Laracuente A., Sheehan P.E., and Whitman L.J. Appl. Phys. Lett. 13 (2006) 033104
6. King W.P., Saxena S., Nelson B.A., Pitchimani R., and Weeks B.L. Nano Lett. 6 (2006) 2145-2149
7. Binnig G., Despont M., Drechsler U., Häberle W., Lutwyche M., Vettiger P., Mamin H.J., Chui B.W., and Kenny T.W. Appl. Phys. Lett. 76 (1999) 1329
8. Chui B.W., Stowe T.D., Ju Y.S., Goodson K.E., Kenny T.W., Mamin H.J., Terris B.D., and Ried R.P. J. Microelectromech. Syst. 7 (1998) 69
9. King W.P., Kenny T.W., Goodson K.E., Cross G.L.W., Despont M., Durig U., Rothuizen H., Binnig G., and Vettiger P. Appl. Phys. Lett. 78 (2001) 1300
10. Lee J., Wright T.L., Beecham T., Nelson B.A., Graham S., and King W.P. J. Microelectromech. Syst. 15 (2006) 1644-1655
11. Ritala M., Leskela M., Niinisto L., and Haussalo P. Chem. Mater. 5 (1993) 1174