Selective atomic layer deposition of metal oxide thin films on patterned self-assembled monolayers formed by microcontact printing

Journal of Nanoscience and Nanotechnology

Volumn 7, Issue 11, 2007, Pages 3758-3764

  Lee, Byoung H ^a   Sung, Myung M ^a  

^a Hanyang University   (South Korea)

Author keywords

Atomic layer deposition; Micro Contact printing; Selective deposition; TiO 2; ZnO; ZrO 2

Indexed keywords

ATOMIC LAYERS; METAL OXIDE THIN FILMS; MICROCONTACT PRINTING]; SELF ASSEMBLED MONOLAYERS (SAMS);

ATOMIC PHYSICS; ATOMS; ELECTRON DEVICE MANUFACTURE; ELECTRONIC EQUIPMENT MANUFACTURE; METALS; OXIDE FILMS; PULSED LASER DEPOSITION; SELF ASSEMBLED MONOLAYERS; THICK FILMS; VAPOR DEPOSITION;

ATOMIC LAYER DEPOSITION;

METAL; NANOMATERIAL; OXIDE; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; METALS; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; OXIDES; PARTICLE SIZE; SURFACE PROPERTIES; TITANIUM;

EID: 38449100983     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2007.018     Document Type: Conference Paper

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