Printing meets lithography: Soft approaches to high-resolution printing

IBM Journal of Research and Development

Volumn 45, Issue 5, 2001, Pages 697-719

  Michel, B ^a   Bernard, A ^a   Bietsch, A ^a   Delamarche, E ^a   Geissler, M ^a   Juncker, D ^a   Kind, H ^a   Renault, J P ^a   Rothuizen, H ^a   Schmid, H ^a   Schmidt Winkel, P ^a   Stutz, R ^a   Wolf, H ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSTS; ELASTOMERS; OPTICAL RESOLVING POWER; ORGANIC COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY;

BIOMOLECULES; ELASTOMERIC STAMP; SOFT LITHOGRAPHY; THIOL;

PHOTORESISTS;

EID: 0035465563     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.455.0697     Document Type: Article

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