Plasma surface modification of organic materials: Comparison between polyethylene films and octadecyltrichlorosilane self-assembled monolayers

Langmuir

Volumn 20, Issue 24, 2004, Pages 10481-10489

  Tatoulian, M ^b   Bouloussa, O ^a   Moriere F ^a   Arefi Khonsari, F ^b   Amouroux, J ^b   Rondelez, F ^a  

^a INSTITUT CURIE   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELLIPSOMETRY; FUNCTIONS; PLASMA ETCHING; SELF ASSEMBLY; SILICON WAFERS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM ABLATION; OPTIMUM TREATMENT TIME; PLASMA DISCHARGES; POLAR FUNCTIONAL GROUPS;

POLYETHYLENES;

AMMONIA; OCTADECYLTRICHLOROSILANE; POLYETHYLENE; SILANE DERIVATIVE; SILICON;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; COMPARATIVE STUDY; METHODOLOGY; SENSITIVITY AND SPECIFICITY; SPECTROMETRY; SURFACE PLASMON RESONANCE; SURFACE PROPERTY; TIME; WETTABILITY;

AMMONIA; MEMBRANES, ARTIFICIAL; POLYETHYLENE; SENSITIVITY AND SPECIFICITY; SILANES; SILICON; SPECTROMETRY, X-RAY EMISSION; SURFACE PLASMON RESONANCE; SURFACE PROPERTIES; TIME FACTORS; WETTABILITY;

CRYSTALLIZATION; ESCA; ETCHING; MONOLAYERS; OXIDATION; PLASMA; POLYETHYLENE; X RAY SPECTROSCOPY;

EID: 10044266604     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0303781     Document Type: Article

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