Effects of interfacial organic layers on nucleation, growth, and morphological evolution in atomic layer thin film deposition

Journal of Physical Chemistry C

Volumn 111, Issue 29, 2007, Pages 11045-11058

  Dube, Abhishek ^a   Sharma, Manish ^a   Ma, Paul F ^a   Ercius, Peter A ^a   Muller, David A ^a   Engstrom, J R ^a  

^a School of Chemical and Molecular Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FUNCTIONAL TERMINATIONS; INTERFACIAL ORGANIC LAYERS; MORPHOLOGICAL EVOLUTION;

ATOMIC LAYER DEPOSITION; FILM GROWTH; NUCLEATION; SILICA; TITANIUM NITRIDE;

THIN FILMS;

EID: 34547653525     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp072264e     Document Type: Article

References (45)

1. International Technology Roadmap for Semiconductors, http://www.itrs.net, 2005.
2. Copper interconnect technology; Steinbrüchel, C., Chin, B. L., Eds.; SPIE Press: Bellingham, WA, 2001.
3. Conjugated Polymer Surfaces and Interfaces, Electronic and Chemical Structure of Interfaces for Polymer Light Emitting Devices; Salaneck, W. R., Stafstrom, S., Bredas, J.-L., Eds.; Cambridge University Press: Cambridge, 1996.
4. Yan, L.; Gao, Y. Thin Solid Films 2002, 417, 101.
5. Molecular Electronics: Science and Technology; Aviram, A., Ratner, M., Eds.; New York Academy of Sciences: New York, 1998.
6. Ishii, H.; Sugiyama, K.; Ito, E.; Seki, K. Adv. Mater. 1999, 11, 605.
7. Chen, J.; Reed, M. A.; Dirk, S. M.; Price, D. W.; Rawlett, A. M.; Tour, J. M.; Grubisha, D. S.; Bennett, D. W. NATO Sci. Ser. II: Math., Phys. Chem. 2003, 96, 59.
8. Haynie, B. C.; Walker, A. V.; Tighe, T. B.; Aliara, D. L.; Winograd, N. Appl. Surf. Sci. 2003, 203, 433.
9. An Introduction to Ultrathin Organic Films, From Langmuir-Blodgett to Self-Assembly; Ulman, A., Ed.; Academic Press: Boston, MA, 1991.
10. Dubois, L. H.; Nuzzo, R. G. Annu. Rev. Phys. Chem. 1992, 43, 437.
11. Ulman, A. Chem. Rev. 1996, 96, 1533.
12. Jung, D. R.; Czanderna, A. W. Crit. Rev. Solid State Mater. Sci. 1994, 19, 1.
13. Herdt, G. C.; Jung, D. R.; Czanderna, A. W. Prog. Surf. Sci. 1995, 50, 103.
14. Jung, D. R.; Czanderna, A. W.; Herdt, G. C. J. Vac. Sci. Technol., A 1996, 14, 1779.
15. Konstadinidis, K.; Zhang, P.; Opila, R. L.; Aliara, D. L. Surf. Sci. 1995, 338, 300.
16. Fisher, G. L.; Hooper, A.; Opila, R. L.; Jung, D. R.; Aliara, D. L.; Winograd, N. J. Electron. Spectrosc. Relat. Phenom. 1999, 98, 139.
17. Zhou, C.; Nagy, G.; Walker, A. V. J. Am. Chem. Soc. 2005, 127, 12160.
18. Nagy, G.; Walker, A. V. J. Phys. Chem. B 2006, 110, 12543.
19. Fischer, R. A.; Weckenmann, U.; Winter, C.; Kashammer, J.; Scheumann, V.; Mittler, S. J. Phys. IV 2001, 11, Pr3/1183.
20. Wohlfart, P.; Weiss, J.; Kashammer, J.; Kreiter, M.; Winter, C.; Fischer, R.; Mittler-Neher, S. Chem. Vap. Deposition 1999, 5, 165.
21. Chen, R.; Kim, H.; McIntyre, P. C.; Bent, S. F. Chem. Mater. 2005, 17, 536.
22. Chen, R.; Bent, S. F. Adv. Mater. 2006, 18, 1086.
23. Park, M. H.; Jang, Y. J.; Sung-Suh, H. M.; Sung, M. M. Langmuir 2004, 20, 2257.
24. Park, K. J.; Doub, J. M.; Gougousi, T.; Parsons, G. N. Appl. Phys. Lett. 2005, 86, 051903.
25. Handbook of Thin Film Materials; Ritala, M., Leskelä, M., Nalwa, H. S., Eds.; Academic Press: New York, 2002; Vol. 1, Chapter 2.
26. (a) Lee, J. P.; Jang, Y. J.; Sung, M. M. Adv. Funct. Mater. 2003, 13, 873
27. (b) Seo, E. K.; Lee, J. W.; Sung-Suh, H. M.; Sung; M. M. Chem. Mater. 2004, 16, 1878.
28. Whelan, C. M.; Demas, A.-C.; Schuhmacher, J.; Carbonell L.; Maex, K. Mater. Res. Soc. Symp. Proc. 2004, 812, F2.2.
29. Killampalli, A. S.; Ma, P. F.; Engstrom, J. R. J. Am. Chem. Soc. 2005, 127, 6300.
30. Ma, P. F.; Dube, A.; Killampalli, A.S.; Engstrom, J. R. J. Chem. Phys. 2006, 125, 034706.
31. Dube, A.; Sharma, M.; Ma, P. F.; Engstrom, J. R. Appl. Phys. Lett. 2006, 89, 164108.
32. Sharma, M.; Dube, A.; Engstrom, J. R. Unpublished results.
33. Roadman, S. E.; Maity, N.; Carter, J. N.; Engstrom, J. R. J. Vac. Sci. Technol., A 1998, 16, 3423.
34. Tomalia, D. A.; Baker, H.; Dewald, J.; Hall, M.; Kallos, G.; Martin, S.; Roeck, J.; Ryder, J.; Smith, P. Polym. J. 1985, 17, 117.
35. Schroeder; T. W. Ph.D. Thesis, Cornell University, 2004.
36. Elam, J. W.; Schuisky, M.; Ferguson, J. D.; George, S. M. Thin Solid Films 2003, 436, 145.
37. Kim, J. Y.; Choi, K. H.; Kim, Y. D.; Kim, Y.; Jeon, H. Jpn. J. Appl. Phys. 2003, 42, 4245.
38. Alam, M. A.; Green, M. L. J. Appl. Phys. 2003, 94, 3403.
39. Calistri-Yeh, M.; Kramer, E. J.; Sharma, R.; Zhao, W.; Rafailovich, M. H.; Sokolov, J.; Brock, J. D. Langmuir 1996, 12, 2747.
40. Dolittle, L. R. Nuci Instrum. Methods 1986, 15, 227.
41. Fractal Concepts in Surface Growth; Barabási, A.-L., Stanley, H. E., Eds.; Cambridge University Press: Cambridge, U.K., 1995.
42. Martin Hoyas, A.; Schuhmacher, J.; Whelan, C. M.; Fernandez Landaluce, T.; Vanhaeren, D.; Maex, K.; Celis, J. P. J. Appl. Phys. 2006, 100, 114903.
43. Bunker, B. C.; Rieke, P. C.; Tarasevich, B. J.; Campbell, A. A.; Fryxell, G. E.; Graff, G. L.; Song, L.; Liu, J.; Virden, J. W.; McVay, G. L. Science 1994, 264, 48.
44. Aizenberg, J.; Black, A. J.; Whitesides, G. M. J. Am. Chem. Soc. 1999, 121, 4500.
45. Li, S.; Sun, C. Q.; Park, H. S. Thin Solid Films 2006, 504, 108.