Photochemical covalent attachment of alkene-derived monolayers onto hydroxyl-terminated silica

Langmuir

Volumn 25, Issue 19, 2009, Pages 11592-11597

  Maat, Jurjen Ter ^a   Regeling, Remco ^a   Yang, Menglong ^a   Mullings, Marja N ^b   Bent, Stacey F ^b   Zuilhof, Han ^a  

^a WAGENINGEN UNIVERSITY   (Netherlands)

^b Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIOSENSING; CHEMICAL PASSIVATION; COVALENT ATTACHMENT; FUNCTIONALIZATIONS; HYDROPHOBIC SURFACES; HYDROXYL-TERMINATED; LAYER GROWTH; PATTERNING METHODS; PROLONGED REACTION; SILICA SURFACE; SOFT LITHOGRAPHY; SURFACE HYDROXYL GROUPS; TERMINAL ALKENES; THERMALLY STABLE; TRANSPARENT SUBSTRATE; UNDERLYING SURFACE;

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; ELECTRON ENERGY LEVELS; HYDROPHOBICITY; INFRARED SPECTROSCOPY; MONOLAYERS; OLEFINS; OLIGOMERIZATION; PASSIVATION; PHOTOCHEMICAL REACTIONS; PLATINUM; SILICA; SPECTROSCOPIC ANALYSIS; SURFACE CHEMISTRY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70349925711     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la901551t     Document Type: Article

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