Octadecyltrichlorosilane adsorption kinetics on Si(100)/SiO2 surface: Contact angle, AFM, FTIR and XPS analysis

Surface and Interface Analysis

Volumn 38, Issue 3, 2006, Pages 158-165

  Mirji, S A ^a  

^a NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

Adsorption; Critical surface tension; Desorption; Gibbs free energy; Nonsequential dipping; OTS; Sequential dipping; Si(100) SiO2; Thermal stability; Zisman plot

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; REACTION KINETICS; SILICA;

NONSEQUENTIAL DIPPING; SEQUENTIAL DIPPING; ZISMAN PLOT;

SILICON;

EID: 33644804506     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2309     Document Type: Article

References (33)

1. Ulman A. An Introduction to Ultra thin Organic Films. Academic Press: Boston, MA, 1991.
2. Liu J, Feng X, Fryxell EG, Wan LQ, Kim AY, Gong M. Adv. Mater. 1998; 10: 161.
3. Swalen JD, Allara DL, Andrade JD, Chandross EA, Garoff S, Irsraelachivili J, McCarthy T, Murry R, Pease RF, Rabolt JF, Wynne KJ, Yu H. Langmuir 1987; 3: 932.
4. Wasserman SR, Tao YT, Whitesides GM. Langmuir 1989; 5:1074.
5. Tidswell IM, Rabedeau TA, Pershan PS, Kosowsky SD, Folkers JP, Whitesides GM. J. Chem. Phys. 1991; 95(4): 2854.
6. Carraro C, Yauw OW, Sung MM, Maboudian R. J. Phys. Chem. B 1998; 102: 4441.
7. Ulman A. Chem. Rev. 1996; 96: 1544.
8. Reiniger M, Basnar B, Friedbacher G, Schleberger M. Surf. Interface Anal. 2002; 33: 85.
9. Jeon NL, Finnie K, Branshaw K, Nuzzo RG. Langmuir 1997; 13: 3382.
10. Finnie KR, Haasch R, Nuzzo RG. Langmuir 2000; 16: 6968.
11. Harada Y, Girolami GS, Nuzzo RG. Langmuir 2004; 20: 10878.
12. Mathauer K, Frank CW. Langmuir 1993; 9: 3446.
13. Xie XN, Chung HJ, Sow CH, Wee ATS. Chemical Physics Letters 2004; 388: 446.
14. Balgar T, Bautista R, Hartmann N, Hasselbrink E. Surf. Sci. 2003; 532-535: 963.
15. Kropman BL, Blank DHA, Rogalla H. Thin Solid Films 1998; 327-329: 185.
16. Mirji SA, Sneha AK, Mulla IS, Vijayamohanan K. Solid State Physics, vol. 46, Sharma SM, Sastry PU, Salunke HG (eds). Allied Publishers: New Delhi, India, 2003; 413.
17. Wang Y, Lieberman M. Langmuir 2003; 19: 1159.
18. Lo YS, Huefner ND, Chan WS, Dryden P, Hagenhoff PB, Beebe TP Jr. Langmuir 1999; 15: 6522.
19. Lower BH, Yongsunthon Y, Vellano FP, Lower SK III J. Bacteriol. 2005; 187: 2127.
20. Kim HK, Lee JP, Park CR, Kwak HT, Sung MM. J. Phys. Chem. B 2003; 107: 4348.
21. XPSPEAK software is a freeware and is available from Kwok RWM: rmkwok@cuhk.edu.hk, www.phy.cuhk.edu.hk/~surface/XPSPEAK/ [2001].
22. Karpovich DS, Blanchard GJ. Langmuir 1994; 10: 3315.
23. Vallant T, Kattner J, Brunner H, Mayer U, Hoffmann H. Langmuir 1999; 15: 5339.
24. Brunner H, Valiant T, Mayer U, Hoffmann H. J. Colloid Interface Sci. 1999; 212: 545.
25. Cheng SS, Scherson DA, Sukenik CM. J. Am. Chem. Soc. 1992; 114: 5436.
26. Richter AG, Yu CJ, Datta A, Kmetko J, Dutta P. Phys. Rev., E 2000; 61: 607.
27. Kosuri MR, Cone R, Li Q, Han SM, Bunker BC, Mayer TM. Langmuir 2004; 20: 835.
28. Schessler HM, Karpovich DS, Blanchard GJ. J. Am. Chem. Soc. 1996; 118: 9645.
29. Hussain Y, Krim J, Grant C. Colloids and Surfaces A: Physicochem. Eng. Aspects 2005; 262: 81.
30. Kluth GJ, Sung MM, Maboudian R. Langmuir 1997; 13: 3775.
31. Wang W, Baran G, Wunder SL. Langmuir 2000; 16: 6298.
32. Tillman N, Ulman A, Schildkraut JC, Penner TL. J. Am. Chem. Soc. 1988; 110: 6136.
33. Hoffman H, Mayer U, Krischanitz A. Langmuir 1995; 11: 1304.