Effects of interfacial organic layers on thin film nucleation in atomic layer deposition

Applied Physics Letters

Volumn 89, Issue 16, 2006, Pages

  Dube, Abhishek ^a   Sharma, Manish ^a   Ma, Paul F ^a   Engstrom, J R ^a  

^a Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MOLECULAR DYNAMICS; SELF ASSEMBLY; SILICA; SURFACE PROPERTIES; TITANIUM NITRIDE;

ATOMIC LAYER DEPOSITION (ALD); INTERFACIAL ORGANIC LAYERS; SELF-ASSEMBLED MONOLAYERS (SAMS);

THIN FILMS;

EID: 33750145597     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2360902     Document Type: Article

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