Film growth model of atomic layer deposition for multicomponent thin films

Journal of Applied Physics

Volumn 97, Issue 9, 2005, Pages

  Kim, Jin Hyock ^a   Kim, Ja Yong ^a   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); NITRIDE FILMS; PRECURSOR ADSORPTION; SURFACE CHANGES;

ADSORPTION; COMPUTER SIMULATION; MICROELECTRONICS; MONOLAYERS; NITRIDES; SUBSTRATES;

THIN FILMS;

EID: 18844411649     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1883728     Document Type: Article

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