Selective atomic layer deposition of HfO2 on copper patterned silicon substrates

Applied Physics Letters

Volumn 96, Issue 19, 2010, Pages

  Tao, Qian ^a   Jursich, Gregory ^a,b   Takoudis, Christos ^a,b  

^a 1120 Science and Engineering Offices   (United States)

^b University of Illinois at Chicago   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOFABRICATION; PATTERNED FILMS; PATTERNED SILICON; SELECTIVE GROWTH;

COPPER; HAFNIUM COMPOUNDS; SELF ASSEMBLED MONOLAYERS; SEMICONDUCTOR GROWTH;

FILM GROWTH;

EID: 77952971224     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3428771     Document Type: Article

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