SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 149, Issue 1, 2002, Pages

Physics of copper in silicon

(2) Istratov, Andrei A a Weber, Eicke R a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION; ELECTROSTATICS; FERMI LEVEL; MASS SPECTROMETRY; NUCLEATION; PARAMAGNETIC RESONANCE; PRECIPITATION (CHEMICAL); SILICON;

LATTICE STRAINS; TRANSIENT ION DRIFT (TID);

COPPER;

EID: 0036222999 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1421348 Document Type: Review

Times cited : (374)

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