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Volumn 79, Issue 4, 1996, Pages 2074-2078
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Influence of interfacial copper on the room temperature oxidation of silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000243369
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.361064 Document Type: Article |
Times cited : (16)
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References (18)
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