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Physica Status Solidi (B) Basic Research

Volumn 222, Issue 1, 2000, Pages 261-277

Impact of the unique physical properties of copper in silicon on characterization of copper diffusion barriers

(3) Istratov, A A a Flink, C a Weber, E R b

a UNIVERSITY OF CALIFORNIA (United States)

b No 1760 (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034336196 PISSN: 03701972 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3951(200011)222:1<261::AID-PSSB261>3.0.CO;2-5 Document Type: Article

Times cited : (23)

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