The role of metal induced oxidation for copper deposition on silicon surface

Journal of the Electrochemical Society

Volumn 144, Issue 9, 1997, Pages 3275-3283

  Kim, J S ^a   Morita, H ^a   Joo, J D ^a   Ohmi, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALS; COPPER; DISSOLUTION; IONIC STRENGTH; MASS TRANSFER; METALS; OXIDATION; PH EFFECTS; SILICON; SOLUTIONS; SURFACES;

DIPPING TIME; METAL INDUCED OXIDATION; PARTICLE GROWING EFFECT; REDOX POTENTIAL; SELF LIMITING EFFECT;

ELECTRODEPOSITION;

EID: 0031235060     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837997     Document Type: Article

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