Characterization of TiN barriers against Cu diffusion by capacitance-voltage measurement

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2019-2025

  Rha, Sa Kyun ^a   Lee, Seung Yun ^a   Lee, Won Jun ^a   Hwang, Yong Sup ^a   Park, Chong Ook ^a   Kim, Dong Won ^b   Lee, Youn Seoung ^c   Whang, Chung Nam ^c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Kyonggi University   (South Korea)

^c Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001515604     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590123     Document Type: Article

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