Detection of copper contamination in silicon by surface photovoltage diffusion length measurements

Applied Physics Letters

Volumn 74, Issue 2, 1999, Pages 278-280

  Henley, Worth B ^a   Ramappa, Deepak A ^a   Jastrezbski, Lubek ^b  

^a UNIVERSITY OF SOUTH FLORIDA   (United States)

^b Semiconductor Diagnostics Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000393120     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123280     Document Type: Article

References (19)

1. K. Honda, A. Ohsawa, and N. Toyokura, Appl. Phys. Lett. 45, 270 (1984).
2. D. A. Ramappa and W. B. Henley, Proceedings of Electrochemical Society (Dielectric Science and Technology, San Diego, 1998).
3. A. G. Cullis and L. E. Katz, Philos. Mag. 30, 1419 (1974).
4. L. T. Canham, M. R. Dyball, and K. G. Barraclough, J. Appl. Phys. 66, 920 (1989).
5. N. Toyama, Solid-State Electron. 26, 37 (1983).
6. H. Lemke, Electrochem. Soc. Proc. 96, 272 (1996).
7. S. D. Brotherton, J. R. Ayres, A. Gill, H. W. van Kesteren, and F. J. A. M. Greidanus, J. Appl. Phys. 62, 1826 (1987).
8. C. Kai-Mao and Q. Guo-Gang, Mater. Sci. Forum 10-12, 1093 (1986).
9. A. A. Istratov, H. Heislmair, C. Flink, T. Heiser, and E. R. Weber, Appl. Phys. Lett. 71, 2349 (1997).
10. H. Lemke, Phys. Status Solidi A 95, 665 (1986).
11. S. Koveshnikov, Y. Pan, and H. Mollenkopf, Electrochem. Soc. Proc. 96, 473 (1996).
12. H. B. Erzgraher and K. Schmalz, J. Appl. Phys. 78, 4066 (1995).
13. J. Weber, H. Bauch, and R. Sauer, Phys. Rev. B 25, 7688 (1982).
14. A. A. Istratov and E. R. Weber, Appl. Phys. A: Solids Surf. 66, 123 (1998).
15. D. A. Ramappa and W. B. Henley, Appl. Phys. Lett. 72, 2298 (1998).
16. A. A. Istratov, C. Flink, H. Hieslmair, T. Heiser, and E. R. Weber, Appl. Phys. Lett. 71, 2121 (1997).
17. S. Naito and T. Nakashizu, Mater. Res. Soc. Symp. Proc. 262, 641 (1992).
18. J. Lagowski, P. Edelman, M. Dexter, and W. B. Henley, Semicond. Sci. Technol. 7, 185 (1992).
19. A. A. Istratov, H. Heislmair, C. Flink, T. Heiser, and E. R. Weber, Appl. Phys. Lett. 72, 474 (1998).