Intrinsic diffusion coefficient of interstitial copper in silicon

Physical Review Letters

Volumn 81, Issue 6, 1998, Pages 1243-1246

  Istratov, Andrei A ^a,c   Flink, Christoph ^a   Hieslmair, Henry ^a   Weber, Eicke R ^a   Heiser, Thomas ^b  

^a University of California ^*  (United States)

^b CNRS   (France)

^c ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343913988     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.81.1243     Document Type: Article

References (16)

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