Behavior of thin Ta-based films in the Cu/barrier/Si system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 3, 1999, Pages 993-1001

  Stavrev, Momtchil ^a,c   Fischer, Dirk ^a   Praessler, Frank ^b   Wenzel, Christian ^a   Drescher, Kurt ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

^c Novellus Systems GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3943104807     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581697     Document Type: Article

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