Characterization of metallic impurities in Si using a recombination-lifetime correlation method

Journal of Applied Physics

Volumn 82, Issue 7, 1997, Pages 3250-3255

  Itsumi, Manabu ^a   Sato, Yoshiyuki ^a   Imai, Kazuo ^a   Yabumoto, Norikuni ^b  

^a NTT CORPORATION   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000818886     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365632     Document Type: Article

References (19)

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