메뉴 건너뛰기




Volumn 8, Issue 6, 2015, Pages 3128-3154

Optical properties and plasmonic performance of titanium nitride

Author keywords

Ellipsometry; Optical properties; Plasmonics; Polaritonics; Titanium nitride

Indexed keywords

ELECTROMAGNETIC WAVE POLARIZATION; ELLIPSOMETRY; METALS; MOS DEVICES; NITRIDES; OPTICAL PROPERTIES; PLASMONS; QUANTUM THEORY; SEMICONDUCTOR GROWTH; SURFACE PLASMON RESONANCE; TIN OXIDES; TITANIUM; TITANIUM COMPOUNDS;

EID: 84936803232     PISSN: None     EISSN: 19961944     Source Type: Journal    
DOI: 10.3390/ma8063128     Document Type: Article
Times cited : (313)

References (156)
  • 1
    • 0025671028 scopus 로고
    • A contribution to the study of Poisson's ratios and elastic constants of TiN, ZrN and HfN.
    • Perry, A.J. A contribution to the study of Poisson's ratios and elastic constants of TiN, ZrN and HfN. Thin Solid Films 1990, 193-194, 463-471.
    • (1990) Thin Solid Films , vol.193-194 , pp. 463-471
    • Perry, A.J.1
  • 2
    • 0028464854 scopus 로고
    • Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films
    • Kuzel, R., Jr., Cerny, R., Valvoda, V., Blomberg, M., Merisalo, M. Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films. Thin Solid Films 1994, 247, 64-78.
    • (1994) Thin Solid Films , vol.247 , pp. 64-78
    • Kuzel, R.1    Cerny, R.2    Valvoda, V.3    Blomberg, M.4    Merisalo, M.5
  • 3
    • 0024641441 scopus 로고
    • The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatings
    • Sproul, W.D., Rudnik, P.J., Gogol, C.A. The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatings. Thin Solid Films 1989, 171, 171-181.
    • (1989) Thin Solid Films , vol.171 , pp. 171-181
    • Sproul, W.D.1    Rudnik, P.J.2    Gogol, C.A.3
  • 4
    • 2942750519 scopus 로고    scopus 로고
    • Investigations on the effects of plasma-assisted pre-treatment for plasma-assisted chemical vapour deposition TiN coatings on tool steel
    • Gammer, K., Stoiber, M., Wagner, J., Hutter, H., Kullmer, R., Mitterer, C. Investigations on the effects of plasma-assisted pre-treatment for plasma-assisted chemical vapour deposition TiN coatings on tool steel. Thin Solid Films 2004, 461, 277-281.
    • (2004) Thin Solid Films , vol.461 , pp. 277-281
    • Gammer, K.1    Stoiber, M.2    Wagner, J.3    Hutter, H.4    Kullmer, R.5    Mitterer, C.6
  • 6
    • 0033708430 scopus 로고    scopus 로고
    • Ultrathin diffusion barriers/liners for gigascale copper metallization
    • Kaloyeros, A.E., Eisenbraun, E. Ultrathin diffusion barriers/liners for gigascale copper metallization. Annu. Rev. Mater. Sci. 2000, 30, 363-385.
    • (2000) Annu. Rev. Mater. Sci. , vol.30 , pp. 363-385
    • Kaloyeros, A.E.1    Eisenbraun, E.2
  • 7
    • 0009053961 scopus 로고    scopus 로고
    • An optimal quasisuperlattice design to further improve thermal stability of tantalum nitride diffusion barriers
    • Chen, G.S., Huang, S.C., Chen, S.T., Yang, T.J., Lee, P.Y., Jou, J.H., Lin, T.C. An optimal quasisuperlattice design to further improve thermal stability of tantalum nitride diffusion barriers. Appl. Phys. Lett. 2000, 76, 2895-2897.
    • (2000) Appl. Phys. Lett. , vol.76 , pp. 2895-2897
    • Chen, G.S.1    Huang, S.C.2    Chen, S.T.3    Yang, T.J.4    Lee, P.Y.5    Jou, J.H.6    Lin, T.C.7
  • 9
    • 7044251998 scopus 로고    scopus 로고
    • Real-time spectroscopic ellipsometry study of ultrathin diffusion barriers for integrated circuits
    • Aouadi, S.M., Shreeman, P.K., Williams, M. Real-time spectroscopic ellipsometry study of ultrathin diffusion barriers for integrated circuits. J. Appl. Phys. 2004, 96, 3949-3955.
    • (2004) J. Appl. Phys. , vol.96 , pp. 3949-3955
    • Aouadi, S.M.1    Shreeman, P.K.2    Williams, M.3
  • 10
    • 0024133089 scopus 로고
    • Hard coatings for decorative applications
    • Randhawa, H. Hard coatings for decorative applications. Surf. Coat. Technol. 1988, 36, 829-836.
    • (1988) Surf. Coat. Technol. , vol.36 , pp. 829-836
    • Randhawa, H.1
  • 12
    • 0036672187 scopus 로고    scopus 로고
    • Variation of color in titanium and zirconium nitride decorative thin films
    • Niyomsoan, S., Grant, W., Olson, D.L., Mishra, B. Variation of color in titanium and zirconium nitride decorative thin films. Thin Solid Films 2002, 415, 187-194.
    • (2002) Thin Solid Films , vol.415 , pp. 187-194
    • Niyomsoan, S.1    Grant, W.2    Olson, D.L.3    Mishra, B.4
  • 14
    • 0037439464 scopus 로고    scopus 로고
    • Interface properties and structural evolution of TiN/Si and TiN/GaN heterostructures
    • Patsalas, P., Logothetidis, S. Interface properties and structural evolution of TiN/Si and TiN/GaN heterostructures. J. Appl. Phys. 2003, 93, 989-998.
    • (2003) J. Appl. Phys. , vol.93 , pp. 989-998
    • Patsalas, P.1    Logothetidis, S.2
  • 15
    • 65249172483 scopus 로고    scopus 로고
    • Plasma energy and work function of conducting transition metal nitrides for electronic applications
    • Matenoglou, G.M., Koutsokeras, L.E., Patsalas, P. Plasma energy and work function of conducting transition metal nitrides for electronic applications. Appl. Phys. Lett. 2009, 94, 152108.
    • (2009) Appl. Phys. Lett. , vol.94 , pp. 152108
    • Matenoglou, G.M.1    Koutsokeras, L.E.2    Patsalas, P.3
  • 16
    • 84872906776 scopus 로고    scopus 로고
    • Structure, electronic properties and electron energy loss spectra of transition metal nitride films
    • Koutsokeras, L.E., Matenoglou, G.M., Patsalas, P. Structure, electronic properties and electron energy loss spectra of transition metal nitride films. Thin Solid Films 2013, 528, 49-52.
    • (2013) Thin Solid Films , vol.528 , pp. 49-52
    • Koutsokeras, L.E.1    Matenoglou, G.M.2    Patsalas, P.3
  • 19
    • 0000325754 scopus 로고    scopus 로고
    • Combined electrical and mechanical properties of titanium nitride thin films as metallization materials
    • Patsalas, P., Charitidis, C., Logothetidis, S., Dimitriadis, C.A., Valassiades, O. Combined electrical and mechanical properties of titanium nitride thin films as metallization materials. J. Appl. Phys. 1999, 86, 5296-5298.
    • (1999) J. Appl. Phys. , vol.86 , pp. 5296-5298
    • Patsalas, P.1    Charitidis, C.2    Logothetidis, S.3    Dimitriadis, C.A.4    Valassiades, O.5
  • 20
    • 84855979593 scopus 로고    scopus 로고
    • Combined TiN-and TaN temperature compensated thin film resistors
    • Malmros, A., Andersson, K., Rorsman, N. Combined TiN-and TaN temperature compensated thin film resistors. Thin Solid Films 2012, 520, 2162-2165.
    • (2012) Thin Solid Films , vol.520 , pp. 2162-2165
    • Malmros, A.1    Andersson, K.2    Rorsman, N.3
  • 21
    • 0024126595 scopus 로고
    • Low temperature tempering-induced changes in bulk resistivity, temperature coefficient of resistivity and stress in physically vapor-deposited TiN
    • Ernsberger, C., Perry, A.J., Lehman, L.P., Miller, A.E., Pelton, A.R., Dabrowski, B.W. Low temperature tempering-induced changes in bulk resistivity, temperature coefficient of resistivity and stress in physically vapor-deposited TiN. Surf. Coat. Technol. 1988, 36, 605-616.
    • (1988) Surf. Coat. Technol. , vol.36 , pp. 605-616
    • Ernsberger, C.1    Perry, A.J.2    Lehman, L.P.3    Miller, A.E.4    Pelton, A.R.5    Dabrowski, B.W.6
  • 22
    • 0030257396 scopus 로고    scopus 로고
    • Growth and electronic properties of epitaxial TiN thin films on 3C-SiC(001) and 6H-SiC(0001) substrates by reactive magnetron sputtering
    • Hultman, L., Ljungcrantz, H., Hallin, C., Janzén, E., Sundgren, J.-E., Pécz, B., Wallenberg, L.R. Growth and electronic properties of epitaxial TiN thin films on 3C-SiC(001) and 6H-SiC(0001) substrates by reactive magnetron sputtering. J. Mater. Res. 1996, 11, 2458-2462.
    • (1996) J. Mater. Res. , vol.11 , pp. 2458-2462
    • Hultman, L.1    Ljungcrantz, H.2    Hallin, C.3    Janzén, E.4    Sundgren, J.-E.5    Pécz, B.6    Wallenberg, L.R.7
  • 24
    • 0024607854 scopus 로고
    • Microstructure modification of TiN by ion bombardment during reactive sputter deposition
    • Petrov, I., Hultman, L., Helmersson, U., Sundgren, J.-E., Greene, J.E. Microstructure modification of TiN by ion bombardment during reactive sputter deposition. Thin Solid Films 1989, 169, 299-314.
    • (1989) Thin Solid Films , vol.169 , pp. 299-314
    • Petrov, I.1    Hultman, L.2    Helmersson, U.3    Sundgren, J.-E.4    Greene, J.E.5
  • 27
    • 0027912369 scopus 로고
    • Relation of deposition conditions of Ti-N films prepared by d.c magnetron sputtering to their microstructure and macrostress
    • Musil, J., Poulek, V., Valvoda, V., Kužel, R., Jr., Jehn, H.A., Baumgärtner, M.E. Relation of deposition conditions of Ti-N films prepared by d.c. magnetron sputtering to their microstructure and macrostress. Surf. Coat. Technol. 1993, 60, 484-488.
    • (1993) Surf. Coat. Technol. , vol.60 , pp. 484-488
    • Musil, J.1    Poulek, V.2    Valvoda, V.3    Kužel, R.4    Jehn, H.A.5    Baumgärtner, M.E.6
  • 28
    • 1642369286 scopus 로고    scopus 로고
    • Diffraction stress analysis in fiber-textured TiN thin films grown by ion-beam sputtering: Application to (001) and mixed (001)+(111) texture.
    • Abadias, G., Tse, Y.Y. Diffraction stress analysis in fiber-textured TiN thin films grown by ion-beam sputtering: Application to (001) and mixed (001)+(111) texture. J. Appl. Phys. 2004, 95, 2414-2428.
    • (2004) J. Appl. Phys. , vol.95 , pp. 2414-2428
    • Abadias, G.1    Tse, Y.Y.2
  • 29
    • 84906317580 scopus 로고    scopus 로고
    • Effect of substrate temperature on the microstructural properties of titanium nitride nanowires grown by pulsed laser deposition
    • Gbordzoe, S., Kotoka, R., Craven, E., Kumar, D., Wu, F., Narayan, J. Effect of substrate temperature on the microstructural properties of titanium nitride nanowires grown by pulsed laser deposition. J. Appl. Phys. 2014, 116, 064310.
    • (2014) J. Appl. Phys. , vol.116
    • Gbordzoe, S.1    Kotoka, R.2    Craven, E.3    Kumar, D.4    Wu, F.5    Narayan, J.6
  • 32
    • 84889794109 scopus 로고    scopus 로고
    • Plasmonics: Fundamentals and Applications
    • New York, NY, USA
    • Maier, S.A. Plasmonics: Fundamentals and Applications; Springer Science and Business Media LLC: New York, NY, USA, 2007; pp. 65-87.
    • (2007) Springer Science and Business Media LLC , pp. 65-87
    • Maier, S.A.1
  • 33
    • 84936796377 scopus 로고    scopus 로고
    • Plasmonics: From Basics to Advanced Topics
    • New York, NY, USA
    • Enoch, S., Bonod, N. Plasmonics: From Basics to Advanced Topics; Springer Science and Business Media LLC: New York, NY, USA, 2007; pp. 105-148, 151-176.
    • (2007) Springer Science and Business Media LLC
    • Enoch, S.1    Bonod, N.2
  • 34
    • 84355166211 scopus 로고    scopus 로고
    • Surface plasmon-polariton amplifiers and lasers
    • Berini, P., de Leon, I. Surface plasmon-polariton amplifiers and lasers. Nat. Phot. 2012, 6, 16-24.
    • (2012) Nat. Phot. , vol.6 , pp. 16-24
    • Berini, P.1    de Leon, I.2
  • 35
    • 35748978803 scopus 로고    scopus 로고
    • Nano-optics from sensing to waveguiding
    • Lal, S., Link, S., Halas, N.J. Nano-optics from sensing to waveguiding. Nat. Phot. 2007, 1, 641-648.
    • (2007) Nat. Phot. , vol.1 , pp. 641-648
    • Lal, S.1    Link, S.2    Halas, N.J.3
  • 36
    • 0042968726 scopus 로고    scopus 로고
    • Surface plasmon subwavelength optics
    • Barnes, W.L., Dereux, A., Ebbesen, T.W. Surface plasmon subwavelength optics. Nature 2003, 424, 824-830.
    • (2003) Nature , vol.424 , pp. 824-830
    • Barnes, W.L.1    Dereux, A.2    Ebbesen, T.W.3
  • 37
    • 55849117370 scopus 로고    scopus 로고
    • Applied physics: Plasmonics applied
    • Polman, A. Applied physics: Plasmonics applied. Science 2008, 322, 868-869.
    • (2008) Science , vol.322 , pp. 868-869
    • Polman, A.1
  • 38
    • 30844454068 scopus 로고    scopus 로고
    • Plasmonics: Merging photonics and electronics at nanoscale dimensions
    • Ozbay, E. Plasmonics: Merging photonics and electronics at nanoscale dimensions. Science 2006, 311, 189-193.
    • (2006) Science , vol.311 , pp. 189-193
    • Ozbay, E.1
  • 39
    • 77951611376 scopus 로고    scopus 로고
    • The Case for Plasmonics
    • Brongersma, M.L., Shalaev, V.M. The Case for Plasmonics. Science 2010, 328, 440-441.
    • (2010) Science , vol.328 , pp. 440-441
    • Brongersma, M.L.1    Shalaev, V.M.2
  • 40
    • 8344281387 scopus 로고    scopus 로고
    • Molecular Plasmonics
    • Van Duyne, R.P. Molecular Plasmonics. Science 2004, 306, 985-986.
    • (2004) Science , vol.306 , pp. 985-986
    • Van Duyne, R.P.1
  • 41
    • 65249150699 scopus 로고    scopus 로고
    • PlasMOStor: A Metal-Oxide-Si Field Effect Plasmonic Modulator
    • Dionne, J.A., Diest, K., Sweatlock, L.A., Atwater H.A. PlasMOStor: A Metal-Oxide-Si Field Effect Plasmonic Modulator. Nano Lett. 2009, 9, 897-902.
    • (2009) Nano Lett. , vol.9 , pp. 897-902
    • Dionne, J.A.1    Diest, K.2    Sweatlock, L.A.3    Atwater, H.A.4
  • 42
    • 84878360317 scopus 로고    scopus 로고
    • Plasmonic enhancement of photocurrent in MoS2 field-effect-transistor
    • Lin, J., Li, H., Zhang, H., Chen, W. Plasmonic enhancement of photocurrent in MoS2 field-effect-transistor. Appl. Phys. Lett. 2013, 102, 203109.
    • (2013) Appl. Phys. Lett. , vol.102 , pp. 203109
    • Lin, J.1    Li, H.2    Zhang, H.3    Chen, W.4
  • 43
    • 84859556207 scopus 로고    scopus 로고
    • Plasmon resonant excitation in grating-gated AlN barrier transistors at terahertz frequency
    • Wang, L., Hu, W., Wang, J., Wang, X., Wang, S., Chen, X., Lu, W. Plasmon resonant excitation in grating-gated AlN barrier transistors at terahertz frequency. Appl. Phys. Lett. 2012, 100, 123501.
    • (2012) Appl. Phys. Lett. , vol.100 , pp. 123501
    • Wang, L.1    Hu, W.2    Wang, J.3    Wang, X.4    Wang, S.5    Chen, X.6    Lu, W.7
  • 46
    • 84905853585 scopus 로고    scopus 로고
    • A plasmonic chip for biomarker discovery and diagnosis of type 1 diabetes
    • Zhang, B., Kumar, R.B., Dai, H., Feldman, B.J. A plasmonic chip for biomarker discovery and diagnosis of type 1 diabetes. Nat. Med. 2014, 20, 948-953.
    • (2014) Nat. Med. , vol.20 , pp. 948-953
    • Zhang, B.1    Kumar, R.B.2    Dai, H.3    Feldman, B.J.4
  • 49
    • 73849087632 scopus 로고    scopus 로고
    • Nanoscale chemical mapping using three-dimensional adiabatic compression of surface plasmon polaritons
    • De Angelis, F., Das, G., Candeloro, P., Patrini, M., Galli, M., Bek, A. Nanoscale chemical mapping using three-dimensional adiabatic compression of surface plasmon polaritons. Nat. Nanotech. 2010, 5, 67-72.
    • (2010) Nat. Nanotech. , vol.5 , pp. 67-72
    • De Angelis, F.1    Das, G.2    Candeloro, P.3    Patrini, M.4    Galli, M.5    Bek, A.6
  • 50
    • 84876374589 scopus 로고    scopus 로고
    • An autonomous photosynthetic device in which all charge carriers derive from surface plasmons
    • Mubeen, S., Lee, J., Singh, N., Krämer, S., Stucky, G.D., Moskovits, M. An autonomous photosynthetic device in which all charge carriers derive from surface plasmons. Nat. Nanotech. 2013, 8, 247-251.
    • (2013) Nat. Nanotech. , vol.8 , pp. 247-251
    • Mubeen, S.1    Lee, J.2    Singh, N.3    Krämer, S.4    Stucky, G.D.5    Moskovits, M.6
  • 52
    • 84887840804 scopus 로고    scopus 로고
    • H-doped black titania with very high solar absorption and excellent photocatalysis enhanced by localized surface plasmon resonance
    • Wang, Z., Yang, C., Lin, T., Yin, H., Chen, P., Wan, D., Xu, F., Huang, F., Lin, J., Xie, X., Jiang, M. H-doped black titania with very high solar absorption and excellent photocatalysis enhanced by localized surface plasmon resonance. Adv. Funct. Mater. 2013, 23, 5444-5450.
    • (2013) Adv. Funct. Mater. , vol.23 , pp. 5444-5450
    • Wang, Z.1    Yang, C.2    Lin, T.3    Yin, H.4    Chen, P.5    Wan, D.6    Xu, F.7    Huang, F.8    Lin, J.9    Xie, X.10    Jiang, M.11
  • 53
    • 70450204621 scopus 로고    scopus 로고
    • Nanoplasmonic Probes of Catalytic Reactions
    • Larsson, E.M., Langhammer, C., Zoric, I., Kasemo, B. Nanoplasmonic Probes of Catalytic Reactions. Science 2009, 326, 1091-1094.
    • (2009) Science , vol.326 , pp. 1091-1094
    • Larsson, E.M.1    Langhammer, C.2    Zoric, I.3    Kasemo, B.4
  • 54
    • 77249099338 scopus 로고    scopus 로고
    • Plasmonics for Improved Photovoltaic Devices
    • Atwater, H.A., Polman, A. Plasmonics for Improved Photovoltaic Devices. Nat. Mater. 2010, 9, 205-213.
    • (2010) Nat. Mater. , vol.9 , pp. 205-213
    • Atwater, H.A.1    Polman, A.2
  • 56
    • 84922347551 scopus 로고    scopus 로고
    • Molecular interfaces for plasmonic hot electron photovoltaics
    • Pelayo García De Arquer, F., Mihi, A., Konstantatos, G. Molecular interfaces for plasmonic hot electron photovoltaics. Nanoscale 2015, 7, 2281-2288.
    • (2015) Nanoscale , vol.7 , pp. 2281-2288
    • Pelayo García De Arquer, F.1    Mihi, A.2    Konstantatos, G.3
  • 57
    • 84877131852 scopus 로고    scopus 로고
    • Plasmonic-enhanced organic photovoltaics: Breaking the 10% efficiency barrier
    • Gan, Q., Bartoli, F.J., Kafafi, Z.H. Plasmonic-enhanced organic photovoltaics: Breaking the 10% efficiency barrier. Adv. Mater. 2013, 25, 2385-2396.
    • (2013) Adv. Mater. , vol.25 , pp. 2385-2396
    • Gan, Q.1    Bartoli, F.J.2    Kafafi, Z.H.3
  • 58
    • 84878734688 scopus 로고    scopus 로고
    • Nanoparticle-based plasmonic organic photovoltaic devices
    • Stratakis, E., Kymakis, E. Nanoparticle-based plasmonic organic photovoltaic devices. Mater. Today 2013, 16, 133-146.
    • (2013) Mater. Today , vol.16 , pp. 133-146
    • Stratakis, E.1    Kymakis, E.2
  • 60
    • 84862281822 scopus 로고    scopus 로고
    • Design of nanostructured solar cells using coupled optical and electrical modeling
    • Deceglie, M.G., Ferry, V.E., Alivisatos, A.P., Atwater, H.A. Design of nanostructured solar cells using coupled optical and electrical modeling. Nano Lett. 2012, 12, 2894-2900.
    • (2012) Nano Lett. , vol.12 , pp. 2894-2900
    • Deceglie, M.G.1    Ferry, V.E.2    Alivisatos, A.P.3    Atwater, H.A.4
  • 63
    • 77955218067 scopus 로고    scopus 로고
    • Nanostructured materials for photon detection
    • Konstantatos, G., Sargent, E.H. Nanostructured materials for photon detection. Nat. Nanotech. 2010, 5, 391-400.
    • (2010) Nat. Nanotech. , vol.5 , pp. 391-400
    • Konstantatos, G.1    Sargent, E.H.2
  • 64
    • 84896325179 scopus 로고    scopus 로고
    • Hot-electron photodetection with a plasmonic nanostripe antenna
    • Chalabi, H., Schoen, D., Brongersma, M.L. Hot-electron photodetection with a plasmonic nanostripe antenna. Nano Lett. 2014, 14, 1374-1380.
    • (2014) Nano Lett. , vol.14 , pp. 1374-1380
    • Chalabi, H.1    Schoen, D.2    Brongersma, M.L.3
  • 68
    • 66249132688 scopus 로고    scopus 로고
    • Five-Dimensional Optical Recording Mediated by Surface Plasmons in Gold Nanorods
    • Zijlstra, P., Chon, J.W.M., Gu, M. Five-Dimensional Optical Recording Mediated by Surface Plasmons in Gold Nanorods. Nature 2009, 459, 410-413.
    • (2009) Nature , vol.459 , pp. 410-413
    • Zijlstra, P.1    Chon, J.W.M.2    Gu, M.3
  • 69
    • 75749128631 scopus 로고    scopus 로고
    • One-Shot Deep-UV-Pulsed laser-induced photomodification of hollow metal nanoparticles for high density data storage on flexible substrates
    • Wan, D., Chen, H.-L., Tseng, S.-C., Wang, L.A., Chen, Y.-P. One-Shot Deep-UV-Pulsed laser-induced photomodification of hollow metal nanoparticles for high density data storage on flexible substrates. ACS Nano 2010, 4, 165-173.
    • (2010) ACS Nano , vol.4 , pp. 165-173
    • Wan, D.1    Chen, H.-L.2    Tseng, S.-C.3    Wang, L.A.4    Chen, Y.-P.5
  • 71
    • 69949184041 scopus 로고    scopus 로고
    • Size Effects on the Melting Temperature of Silver Nanoparticles: In-situ TEM Observations
    • Asoro, M.A., Damiano, J., Ferreira, P.J. Size Effects on the Melting Temperature of Silver Nanoparticles: In-situ TEM Observations. Microsc. Microanal. 2009, 15, 706-707.
    • (2009) Microsc. Microanal. , vol.15 , pp. 706-707
    • Asoro, M.A.1    Damiano, J.2    Ferreira, P.J.3
  • 72
    • 67349261300 scopus 로고    scopus 로고
    • Effect of Nanoparticle Size on the Onset Temperature of Surface Melting
    • Chernyshev, A.P. Effect of Nanoparticle Size on the Onset Temperature of Surface Melting. Mater. Lett. 2009, 63, 1525-1527.
    • (2009) Mater. Lett. , vol.63 , pp. 1525-1527
    • Chernyshev, A.P.1
  • 73
    • 84879111151 scopus 로고    scopus 로고
    • Determination of Complete Melting and Surface Premelting Points of Silver Nanoparticles by Molecular Dynamics Simulation
    • Alarifi, H.A., Atis, M., Özdogan, C., Hu, A., Yavuz, M., Zhou, Y. Determination of Complete Melting and Surface Premelting Points of Silver Nanoparticles by Molecular Dynamics Simulation. J. Phys. Chem. C 2013, 117, 12289-12298.
    • (2013) J. Phys. Chem. C , vol.117 , pp. 12289-12298
    • Alarifi, H.A.1    Atis, M.2    Özdogan, C.3    Hu, A.4    Yavuz, M.5    Zhou, Y.6
  • 74
    • 84926483960 scopus 로고
    • Electrical resistivity of copper, gold palladium and silver
    • Matula, R.A. Electrical resistivity of copper, gold palladium and silver. J. Phys. Chem. Ref. Data 1979, 8, 1147-1298.
    • (1979) J. Phys. Chem. Ref. Data , vol.8 , pp. 1147-1298
    • Matula, R.A.1
  • 75
    • 78751690181 scopus 로고    scopus 로고
    • Low-Loss Plasmonic Metamaterials
    • Boltasseva, A., Atwater, H.A. Low-Loss Plasmonic Metamaterials. Science 2011, 331, 290-291.
    • (2011) Science , vol.331 , pp. 290-291
    • Boltasseva, A.1    Atwater, H.A.2
  • 76
    • 0024105483 scopus 로고
    • Microhardness of Ti-N films containing the e-Ti2N phase
    • Poulek, V., Musil, J., Valvoda, V., Cerny, R. Microhardness of Ti-N films containing the e-Ti2N phase. J. Phys. D 1988, 21, 1657-1658.
    • (1988) J. Phys. D , vol.21 , pp. 1657-1658
    • Poulek, V.1    Musil, J.2    Valvoda, V.3    Cerny, R.4
  • 77
    • 0022662437 scopus 로고
    • Formation of compounds by high-flux nitrogen ion implantation in titanium
    • Rauschenbach, B. Formation of compounds by high-flux nitrogen ion implantation in titanium. J. Mater. Sci. 1986, 21, 395-404.
    • (1986) J. Mater. Sci. , vol.21 , pp. 395-404
    • Rauschenbach, B.1
  • 79
    • 0038735497 scopus 로고    scopus 로고
    • Hafnium nitride with thorium phosphide structure: Physical properties and an assessment of the Hf-N, Zr-N, and Ti-N phase diagrams at high pressures and temperatures
    • Kroll, P. Hafnium nitride with thorium phosphide structure: Physical properties and an assessment of the Hf-N, Zr-N, and Ti-N phase diagrams at high pressures and temperatures. Phys. Rev. Lett. 2003, 90, 12550.
    • (2003) Phys. Rev. Lett. , vol.90 , pp. 12550
    • Kroll, P.1
  • 80
    • 0034906053 scopus 로고    scopus 로고
    • Electronic structure and physical properties of early transition metal mononitrides: Density-functional theory LDA, GGA, and screened-exchange LDA FLAPW calculations
    • Stampfl, C., Mannstadt, W., Asahi, R., Freeman, A.J. Electronic structure and physical properties of early transition metal mononitrides: Density-functional theory LDA, GGA, and screened-exchange LDA FLAPW calculations. Phys. Rev. B 2001, 63, 155106.
    • (2001) Phys. Rev. B , vol.63 , pp. 155106
    • Stampfl, C.1    Mannstadt, W.2    Asahi, R.3    Freeman, A.J.4
  • 81
    • 80053022288 scopus 로고    scopus 로고
    • First-principles studies of the electronic and elastic properties of metal nitrides XN (X = Sc, Ti, V, Cr, Zr, Nb)
    • Brik, M.G., Ma, C.-G. First-principles studies of the electronic and elastic properties of metal nitrides XN (X = Sc, Ti, V, Cr, Zr, Nb). Comp. Mater. Sci. 2012, 51, 380-388.
    • (2012) Comp. Mater. Sci. , vol.51 , pp. 380-388
    • Brik, M.G.1    Ma, C.-G.2
  • 83
    • 0024091026 scopus 로고
    • Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition
    • Hultman, L., Barnett, S.A., Sundgren, J.-E., Greene, J.E. Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition. J. Cryst. Growth 1988, 92, 639-656.
    • (1988) J. Cryst. Growth , vol.92 , pp. 639-656
    • Hultman, L.1    Barnett, S.A.2    Sundgren, J.-E.3    Greene, J.E.4
  • 85
    • 0025701313 scopus 로고
    • High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system.
    • Sproul, W.D., Rudnik, P.J., Graham, M.E., Rohde, S.L. High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system. Surf. Coat. Technol. 1990, 43-44, 270-278.
    • (1990) Surf. Coat. Technol. , vol.43-44 , pp. 270-278
    • Sproul, W.D.1    Rudnik, P.J.2    Graham, M.E.3    Rohde, S.L.4
  • 86
    • 0033882382 scopus 로고    scopus 로고
    • The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films
    • Patsalas, P., Charitidis, C., Logothetidis, S. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films. Surf. Coat. Technol. 2000, 125, 335-340.
    • (2000) Surf. Coat. Technol. , vol.125 , pp. 335-340
    • Patsalas, P.1    Charitidis, C.2    Logothetidis, S.3
  • 87
    • 0035387766 scopus 로고    scopus 로고
    • Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique.
    • Martin, N., Sanjinés, R., Takadoum, J., Lévy, F. Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique. Surf. Coat. Technol. 2001, 142-144, 615-620.
    • (2001) Surf. Coat. Technol. , vol.142-144 , pp. 615-620
    • Martin, N.1    Sanjinés, R.2    Takadoum, J.3    Lévy, F.4
  • 88
    • 0036670866 scopus 로고    scopus 로고
    • A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatings
    • Mayrhofer, P.H., Kunc, F., Musil, J., Mitterer, C. A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatings. Thin Solid Films 2002, 415, 151-159.
    • (2002) Thin Solid Films , vol.415 , pp. 151-159
    • Mayrhofer, P.H.1    Kunc, F.2    Musil, J.3    Mitterer, C.4
  • 89
    • 52349100717 scopus 로고    scopus 로고
    • In situ stress evolution during magnetron sputtering of transition metal nitride thin films
    • Abadias, G., Guerin, P. In situ stress evolution during magnetron sputtering of transition metal nitride thin films. Appl. Phys. Lett. 2008, 93, 111908.
    • (2008) Appl. Phys. Lett. , vol.93 , pp. 111908
    • Abadias, G.1    Guerin, P.2
  • 90
    • 63649164133 scopus 로고    scopus 로고
    • Reactive sputter deposition of TiN layers: Modelling the growth by characterization of particle fluxes towards the substrate
    • Mahieu, S., Depla, D. Reactive sputter deposition of TiN layers: Modelling the growth by characterization of particle fluxes towards the substrate. J. Phys. D 2009, 42, 053002.
    • (2009) J. Phys. D , vol.42
    • Mahieu, S.1    Depla, D.2
  • 91
  • 92
    • 0032665711 scopus 로고    scopus 로고
    • Effect of deposition conditions on the properties of TiN thin films prepared by filtered cathodic vacuum-arc technique
    • Tay, B.K., Shi, X., Yang, H.S., Tan, H.S., Chua, D., Teo, S.Y. Effect of deposition conditions on the properties of TiN thin films prepared by filtered cathodic vacuum-arc technique. Surf. Coat. Technol. 1999, 111, 229-233.
    • (1999) Surf. Coat. Technol. , vol.111 , pp. 229-233
    • Tay, B.K.1    Shi, X.2    Yang, H.S.3    Tan, H.S.4    Chua, D.5    Teo, S.Y.6
  • 93
    • 0037103447 scopus 로고    scopus 로고
    • Substrate bias dependence of Raman spectra for TiN films deposited by filtered cathodic vacuum arc
    • Cheng, Y.H., Tay, B.K., Lau, S.P., Kupfer, H., Richter, F. Substrate bias dependence of Raman spectra for TiN films deposited by filtered cathodic vacuum arc. J. Appl. Phys. 2002, 92, 1845-1849.
    • (2002) J. Appl. Phys. , vol.92 , pp. 1845-1849
    • Cheng, Y.H.1    Tay, B.K.2    Lau, S.P.3    Kupfer, H.4    Richter, F.5
  • 94
    • 0025701304 scopus 로고
    • Surface processes and rate-determining steps in plasma-induced chemical vapour deposition: Titanium nitride, boron carbide and silicon.
    • Vepřek, S. Surface processes and rate-determining steps in plasma-induced chemical vapour deposition: Titanium nitride, boron carbide and silicon. Surf. Coat. Technol. 1990, 43-44, 154-166.
    • (1990) Surf. Coat. Technol. , vol.43-44 , pp. 154-166
    • Vepřek, S.1
  • 97
    • 0024131192 scopus 로고
    • Nitrides of titanium, niobium, tantalum and molybdenum grown as thin films by the atomic layer epitaxy method
    • Hiltunen, L., Leskelä, M., Mäkelä, M., Niinistö, L., Nykänen, E., Soininen, P. Nitrides of titanium, niobium, tantalum and molybdenum grown as thin films by the atomic layer epitaxy method. Thin Solid Films 1988, 166, 149-154.
    • (1988) Thin Solid Films , vol.166 , pp. 149-154
    • Hiltunen, L.1    Leskelä, M.2    Mäkelä, M.3    Niinistö, L.4    Nykänen, E.5    Soininen, P.6
  • 98
    • 0030172430 scopus 로고    scopus 로고
    • Characteristics of titanium nitride films grown by pulsed laser deposition
    • Chowdhury, R., Vispute, R.D., Jagannadham, K., Narayan, J. Characteristics of titanium nitride films grown by pulsed laser deposition. J. Mater. Res. 1996, 11, 1458-1469.
    • (1996) J. Mater. Res. , vol.11 , pp. 1458-1469
    • Chowdhury, R.1    Vispute, R.D.2    Jagannadham, K.3    Narayan, J.4
  • 99
    • 79956025644 scopus 로고    scopus 로고
    • Epitaxial growth of TaN thin films on Si(100) and Si(111) using a TiN buffer layer
    • Wang, H., Tiwari, A., Kvit, A., Zhang, X., Narayan, J. Epitaxial growth of TaN thin films on Si(100) and Si(111) using a TiN buffer layer. Appl. Phys. Lett. 2002, 80, 2323-2325.
    • (2002) Appl. Phys. Lett. , vol.80 , pp. 2323-2325
    • Wang, H.1    Tiwari, A.2    Kvit, A.3    Zhang, X.4    Narayan, J.5
  • 100
    • 0041495999 scopus 로고
    • Microstructural investigations on titanium nitride films formed by medium energy ion beam assisted deposition.
    • Ensinger, W., Rauschenbach, B. Microstructural investigations on titanium nitride films formed by medium energy ion beam assisted deposition. Nucl. Inst. Meth. Phys. Res. B 1993, 80-81, 1409-1414.
    • (1993) Nucl. Inst. Meth. Phys. Res. B , vol.80-81 , pp. 1409-1414
    • Ensinger, W.1    Rauschenbach, B.2
  • 101
    • 77955660605 scopus 로고    scopus 로고
    • Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit
    • Paulitsch, J., Schenkel, M., Zufraß, T., Mayrhofer, P.H., Münz, W.-D. Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit. Thin Solid Films 2010, 518, 5558-5564.
    • (2010) Thin Solid Films , vol.518 , pp. 5558-5564
    • Paulitsch, J.1    Schenkel, M.2    Zufraß, T.3    Mayrhofer, P.H.4    Münz, W.-D.5
  • 103
    • 0031097943 scopus 로고    scopus 로고
    • Morphology of epitaxial TiN(001) grown by magnetron sputtering
    • Karr, B.W., Petrov, I., Cahill, D.G., Greene, J.E. Morphology of epitaxial TiN(001) grown by magnetron sputtering. Appl. Phys. Lett. 1997, 70, 1703-1705.
    • (1997) Appl. Phys. Lett. , vol.70 , pp. 1703-1705
    • Karr, B.W.1    Petrov, I.2    Cahill, D.G.3    Greene, J.E.4
  • 104
    • 0142027007 scopus 로고    scopus 로고
    • Initial growth stage of nanoscaled TiN films: Formation of continuous amorphous layers and thickness-dependent crystal nucleation
    • Li, T.Q., Noda, S., Komiyama, H., Yamamoto, T., Ikuhara, Y. Initial growth stage of nanoscaled TiN films: Formation of continuous amorphous layers and thickness-dependent crystal nucleation. J. Vac. Sci. Technol. A 2003, 21, 1717-1723.
    • (2003) J. Vac. Sci. Technol. A , vol.21 , pp. 1717-1723
    • Li, T.Q.1    Noda, S.2    Komiyama, H.3    Yamamoto, T.4    Ikuhara, Y.5
  • 105
    • 0038650933 scopus 로고    scopus 로고
    • Pathways of atomistic processes on TiN(001) and 111 surfaces during film growth: An ab initio study
    • Gall, D., Kodambaka, S., Wall, M.A., Petrov, I., Greene, J.E. Pathways of atomistic processes on TiN(001) and (111) surfaces during film growth: An ab initio study. J. Appl. Phys. 2003, 93, 9086-9094.
    • (2003) J. Appl. Phys. , vol.93 , pp. 9086-9094
    • Gall, D.1    Kodambaka, S.2    Wall, M.A.3    Petrov, I.4    Greene, J.E.5
  • 106
    • 25144436730 scopus 로고    scopus 로고
    • Surface kinetics and subplantation phenomena affecting the texture, morphology, stress, and growth evolution of titanium nitride films
    • Patsalas, P., Gravalidis, C., Logothetidis, S. Surface kinetics and subplantation phenomena affecting the texture, morphology, stress, and growth evolution of titanium nitride films. J. Appl. Phys. 2004, 96, 6234-6246.
    • (2004) J. Appl. Phys. , vol.96 , pp. 6234-6246
    • Patsalas, P.1    Gravalidis, C.2    Logothetidis, S.3
  • 107
    • 33745293437 scopus 로고    scopus 로고
    • Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering
    • Abadias, G., Tse, Y.Y., Guérin, Ph., Pelosin, V. Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering. J. Appl. Phys. 2006, 99, 113519.
    • (2006) J. Appl. Phys. , vol.99 , pp. 113519
    • Abadias, G.1    Tse, Y.Y.2    Guérin, Ph.3    Pelosin, V.4
  • 108
    • 0026943781 scopus 로고
    • Evaluation of optical properties of decorative coatings by spectroscopic ellipsometry
    • Beck, U., Reiners, G., Urban, I., Witt, K. Evaluation of optical properties of decorative coatings by spectroscopic ellipsometry. Thin Solid Films 1992, 220, 234-240.
    • (1992) Thin Solid Films , vol.220 , pp. 234-240
    • Beck, U.1    Reiners, G.2    Urban, I.3    Witt, K.4
  • 109
    • 0030246245 scopus 로고    scopus 로고
    • Characterization of the Optical Properties and Composition of TiN Thin Films by Spectroscopic Ellipsometry and X-ray Photoelectron Spectroscopy
    • Bendavid, A., Martin, P.J., Netterfield, R.P., Kinder T.J. Characterization of the Optical Properties and Composition of TiN Thin Films by Spectroscopic Ellipsometry and X-ray Photoelectron Spectroscopy. Surf. Interf. Anal. 1996, 24, 627-633.
    • (1996) Surf. Interf. Anal. , vol.24 , pp. 627-633
    • Bendavid, A.1    Martin, P.J.2    Netterfield, R.P.3    Kinder, T.J.4
  • 110
    • 0028757517 scopus 로고
    • Optical and electrical properties of reactively sputtered, TiN, ZrN, and HfN thin films
    • Edlou, S.M., Simons, J.C., Al-Jumaily, G.A., Raouf N.A. Optical and electrical properties of reactively sputtered, TiN, ZrN, and HfN thin films. Proc. SPIE 1994, 2262, 96-106.
    • (1994) Proc. SPIE , vol.2262 , pp. 96-106
    • Edlou, S.M.1    Simons, J.C.2    Al-Jumaily, G.A.3    Raouf, N.A.4
  • 111
    • 0000983080 scopus 로고    scopus 로고
    • xN(001): Optical and electronic transport properties
    • xN(001): Optical and electronic transport properties. J. Appl. Phys. 2001, 89, 401-409.
    • (2001) J. Appl. Phys. , vol.89 , pp. 401-409
    • Gall, D.1    Petrov, I.2    Greene, J.E.3
  • 112
    • 0035387736 scopus 로고    scopus 로고
    • Optical characterization of TiN produced by metal-plasma immersion ion implantation.
    • Huber, P., Manova, D., Mändl, S., Rauschenbach B. Optical characterization of TiN produced by metal-plasma immersion ion implantation. Surf. Coat. Technol. 2001, 142-144, 418-423.
    • (2001) Surf. Coat. Technol. , vol.142-144 , pp. 418-423
    • Huber, P.1    Manova, D.2    Mändl, S.3    Rauschenbach, B.4
  • 117
    • 0001357730 scopus 로고
    • In-situ spectroscopic ellipsometry to monitor the process of TiN thin films deposited by reactive sputtering
    • Logothetidis, S., Alexandrou, I., Papadopoulos, A. In-situ spectroscopic ellipsometry to monitor the process of TiN thin films deposited by reactive sputtering. J. Appl. Phys. 1995, 77, 1043-1047.
    • (1995) J. Appl. Phys. , vol.77 , pp. 1043-1047
    • Logothetidis, S.1    Alexandrou, I.2    Papadopoulos, A.3
  • 119
    • 0026186003 scopus 로고
    • Surface reflectivity of TiN thin films measured by spectral ellipsometry.
    • Pascual, E., Polo, M.C., Esteve, J., Bertran, E. Surface reflectivity of TiN thin films measured by spectral ellipsometry. Surf. Sci. 1991, 251-252, 200-203.
    • (1991) Surf. Sci. , vol.251-252 , pp. 200-203
    • Pascual, E.1    Polo, M.C.2    Esteve, J.3    Bertran, E.4
  • 120
    • 0035502967 scopus 로고    scopus 로고
    • Optical, electronic, and transport properties of nanocrystalline titanium nitride thin films
    • Patsalas, P., Logothetidis, S. Optical, electronic, and transport properties of nanocrystalline titanium nitride thin films. J. Appl. Phys. 2001, 90, 4725-4734.
    • (2001) J. Appl. Phys. , vol.90 , pp. 4725-4734
    • Patsalas, P.1    Logothetidis, S.2
  • 121
    • 0035873356 scopus 로고    scopus 로고
    • Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry.
    • Postava, K., Aoyama, M., Yamaguchi, T. Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry. Appl. Surf. Sci. 2001, 175-176, 270-275.
    • (2001) Appl. Surf. Sci. , vol.175-176 , pp. 270-275
    • Postava, K.1    Aoyama, M.2    Yamaguchi, T.3
  • 122
    • 84875422526 scopus 로고    scopus 로고
    • On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films
    • Van Bui, H., Kovalgin, A.Y., Wolters, R.A.M. On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films. Appl. Surf. Sci. 2013, 269, 45-49.
    • (2013) Appl. Surf. Sci. , vol.269 , pp. 45-49
    • Van Bui, H.1    Kovalgin, A.Y.2    Wolters, R.A.M.3
  • 123
    • 0028671192 scopus 로고
    • Determination of chemical composition and its relationship with optical properties of Ti-N and Ti-V-N sputtered thin films.
    • Wiemer, C., Lévy, F., Bussy, F. Determination of chemical composition and its relationship with optical properties of Ti-N and Ti-V-N sputtered thin films. Surf. Coat. Technol. 1994, 68-69, 181-187.
    • (1994) Surf. Coat. Technol. , vol.68-69 , pp. 181-187
    • Wiemer, C.1    Lévy, F.2    Bussy, F.3
  • 124
    • 0029228337 scopus 로고
    • The influence of deposition parameters on optical properties of titanium nitride thin films
    • Braic, V., Braic, M., Pavelescu, G., Melinte, D., Necsoiu, D. The influence of deposition parameters on optical properties of titanium nitride thin films. Proc. SPIE 1995, 2461, 597-599.
    • (1995) Proc. SPIE , vol.2461 , pp. 597-599
    • Braic, V.1    Braic, M.2    Pavelescu, G.3    Melinte, D.4    Necsoiu, D.5
  • 126
    • 13544253849 scopus 로고    scopus 로고
    • Production of dense and oriented structures including titanium nitride by energetic condensation from plasmas.
    • McKenzie, D.R., McFall, W.D., Nguyen, H.H., Yin, Y. Production of dense and oriented structures including titanium nitride by energetic condensation from plasmas. Surf. Sci. 1996, 357-358, 954-960.
    • (1996) Surf. Sci. , vol.357-358 , pp. 954-960
    • McKenzie, D.R.1    McFall, W.D.2    Nguyen, H.H.3    Yin, Y.4
  • 128
    • 0023961878 scopus 로고
    • Variations in the reflectance of TiN, ZrN and HfN.
    • Perry, A.J., Georgson, M., Sproul, W.D., Variations in the reflectance of TiN, ZrN and HfN. Thin Solid Films 1988, 157, 255-265.
    • (1988) Thin Solid Films , vol.157 , pp. 255-265
    • Perry, A.J.1    Georgson, M.2    Sproul, W.D.3
  • 130
    • 0028259877 scopus 로고
    • Excitation of surface plasmons on titanium nitride films: Determination of the dielectric function
    • Steinmüller-Nethl, D., Kovacs, R., Gornik, E., Rödhammer, P. Excitation of surface plasmons on titanium nitride films: Determination of the dielectric function. Thin Solid Films 1994, 237, 277-281.
    • (1994) Thin Solid Films , vol.237 , pp. 277-281
    • Steinmüller-Nethl, D.1    Kovacs, R.2    Gornik, E.3    Rödhammer, P.4
  • 132
    • 84860126523 scopus 로고    scopus 로고
    • Oxides and nitrides as alternative plasmonic materials in the optical range
    • Naik, G.V., Kim, J., Boltasseva, A. Oxides and nitrides as alternative plasmonic materials in the optical range. Opt. Mater. Expr. 2011, 1, 1090-1099.
    • (2011) Opt. Mater. Expr. , vol.1 , pp. 1090-1099
    • Naik, G.V.1    Kim, J.2    Boltasseva, A.3
  • 135
    • 0001749238 scopus 로고
    • Kramers-Kronig analysis of reflection data
    • Roessler, D.M. Kramers-Kronig analysis of reflection data. Br. J. Appl. Phys. 1965, 16, 1119-1123.
    • (1965) Br. J. Appl. Phys. , vol.16 , pp. 1119-1123
    • Roessler, D.M.1
  • 136
    • 0003688580 scopus 로고
    • Optical Properties of Thin Solid Films, 2nd ed.
    • Dover Publications: New York, NY, USA
    • Heavens, O.S. Optical Properties of Thin Solid Films, 2nd ed., Dover Publications: New York, NY, USA; 1991; pp. 96-155.
    • (1991) , pp. 96-155
    • Heavens, O.S.1
  • 137
    • 0003417617 scopus 로고    scopus 로고
    • WIEN2k, Augmented Plane Wave Local Orbitals Program for Calculating Crystal Properties
    • Vienna University of Technology: Vienna, Austria
    • Blaha, P., Schwarz, K., Madsen, G.K.H., Kuasnicka, D., Luitz, J. WIEN2k, Augmented Plane Wave Local Orbitals Program for Calculating Crystal Properties; Vienna University of Technology: Vienna, Austria, 2001.
    • (2001)
    • Blaha, P.1    Schwarz, K.2    Madsen, G.K.H.3    Kuasnicka, D.4    Luitz, J.5
  • 138
    • 4243943295 scopus 로고    scopus 로고
    • Generalized Gradient Approximation Made Simple
    • Perdew, J.P., Burke, K., Ernzerhof, M. Generalized Gradient Approximation Made Simple. Phys. Rev. Lett. 1996, 77, 3865-3868.
    • (1996) Phys. Rev. Lett. , vol.77 , pp. 3865-3868
    • Perdew, J.P.1    Burke, K.2    Ernzerhof, M.3
  • 143
    • 0022489379 scopus 로고
    • Material selection for hard coatings
    • Holleck, H. Material selection for hard coatings. J. Vac. Sci. Technol. A 1986, 4, 2661-2669.
    • (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 2661-2669
    • Holleck, H.1
  • 144
    • 0031097520 scopus 로고    scopus 로고
    • Transition metal carbides, nitrides, and borides for electronic applications
    • Williams, W.S. Transition metal carbides, nitrides, and borides for electronic applications. JOM 1997, 49, 38-42.
    • (1997) JOM , vol.49 , pp. 38-42
    • Williams, W.S.1
  • 145
    • 84919772580 scopus 로고    scopus 로고
    • Synthesis, electron transport properties of transition metal nitrides and applications
    • Ningthoujam, R.S., Gajbhiye, N.S. Synthesis, electron transport properties of transition metal nitrides and applications. Prog. Mater. Sci. 2015, 70, 50-154.
    • (2015) Prog. Mater. Sci. , vol.70 , pp. 50-154
    • Ningthoujam, R.S.1    Gajbhiye, N.S.2
  • 148
    • 0032357941 scopus 로고    scopus 로고
    • Synthesis and characterization of highly textured polycrystalline AlN/TiN superlattice coatings
    • Wang, Y.Y., Wong, M.S., Chia, W.J., Rechner, J., Sproul, W.D. Synthesis and characterization of highly textured polycrystalline AlN/TiN superlattice coatings. J. Vac. Sci. Technol. A 1998, 16, 3341-3347.
    • (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 3341-3347
    • Wang, Y.Y.1    Wong, M.S.2    Chia, W.J.3    Rechner, J.4    Sproul, W.D.5
  • 149
    • 0034499643 scopus 로고    scopus 로고
    • Preparation and characterization of AlN/ZrN and AlN/TiN nanolaminate coatings.
    • Wong, M.-S., Hsiao, G.-Y., Yang, S.-Y. Preparation and characterization of AlN/ZrN and AlN/TiN nanolaminate coatings. Surf. Coat. Technol. 2000, 133-134, 160-165.
    • (2000) Surf. Coat. Technol. , vol.133-134 , pp. 160-165
    • Wong, M.-S.1    Hsiao, G.-Y.2    Yang, S.-Y.3
  • 150
    • 0036535005 scopus 로고    scopus 로고
    • Effects of annealing on the microstructures and mechanical properties of TiN/AlN nano-multilayer films prepared by ion-beam assisted deposition
    • Kim, D.-G., Seong, T.-Y., Baik, Y.-J. Effects of annealing on the microstructures and mechanical properties of TiN/AlN nano-multilayer films prepared by ion-beam assisted deposition. Surf. Coat. Technol. 2002, 153, 79-83.
    • (2002) Surf. Coat. Technol. , vol.153 , pp. 79-83
    • Kim, D.-G.1    Seong, T.-Y.2    Baik, Y.-J.3
  • 151
    • 0036494090 scopus 로고    scopus 로고
    • Room-temperature fabrication of hard AlN/TiN superlattice coatings by pulsed laser deposition
    • Pankov, V., Evstigneev, M., Prince, R.H. Room-temperature fabrication of hard AlN/TiN superlattice coatings by pulsed laser deposition. J. Vac. Sci. Technol. A 2002, 20, 430-436.
    • (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 430-436
    • Pankov, V.1    Evstigneev, M.2    Prince, R.H.3
  • 152
    • 33751222569 scopus 로고    scopus 로고
    • Relative orientation of the constituents on the degree of crystallographic coherence in AlN/TiN superlattices
    • Karimi, A., Allidi, G., Sanjines, R. Relative orientation of the constituents on the degree of crystallographic coherence in AlN/TiN superlattices. Surf. Coat. Technol. 2006, 201, 4062-4067.
    • (2006) Surf. Coat. Technol. , vol.201 , pp. 4062-4067
    • Karimi, A.1    Allidi, G.2    Sanjines, R.3
  • 153
    • 4944244081 scopus 로고    scopus 로고
    • Coherent growth and superhardness effect of AlN/TiN nanomultilayers
    • Mei, F.H., Shao, N., Dai, J.W., Li, G.Y. Coherent growth and superhardness effect of AlN/TiN nanomultilayers. Mater. Lett. 2004, 58, 3477-3480.
    • (2004) Mater. Lett. , vol.58 , pp. 3477-3480
    • Mei, F.H.1    Shao, N.2    Dai, J.W.3    Li, G.Y.4
  • 154
    • 0003350952 scopus 로고
    • Colours in Metal Glasses and in Metallic Films
    • Maxwell-Garnett, J.C. Colours in Metal Glasses and in Metallic Films. Phil. Trans. R. Soc. Lond. A 1904, 203, 385-420.
    • (1904) Phil. Trans. R. Soc. Lond. A , vol.203 , pp. 385-420
    • Maxwell-Garnett, J.C.1
  • 155
    • 77349114963 scopus 로고    scopus 로고
    • Optical properties and Plasmon resonances of titanium nitride nanostructures
    • Cortie, M.B., Giddings, J., Dowd, A. Optical properties and Plasmon resonances of titanium nitride nanostructures. Nanotechnology 2010, 21, 115201.
    • (2010) Nanotechnology , vol.21 , pp. 115201
    • Cortie, M.B.1    Giddings, J.2    Dowd, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.