Oxides and nitrides as alternative plasmonic materials in the optical range [Invited]

Optical Materials Express

Volumn 1, Issue 6, 2011, Pages 1090-1099

  Naik, Gururaj V ^a   Kim, Jongbum ^a   Boltasseva, Alexandra ^a,b,c  

^a PURDUE UNIVERSITY   (United States)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL METALS; INDIUM TIN OXIDE; INTRINSIC LOSS; METAMATERIAL DEVICES; NANOFABRICATION PROCESS; NEAR-IR; OPTICAL RANGE; PLASMONIC; PLASMONICS; TRANSITION METAL NITRIDES; TRANSPARENT CONDUCTING OXIDE; TUNABILITIES; VISIBLE FREQUENCIES; FABRICATION AND CHARACTERIZATIONS;

METAMATERIALS; PLASMONS; TIN; TITANIUM NITRIDE; TRANSITION METALS; ZINC OXIDE; II-VI SEMICONDUCTORS; NANOTECHNOLOGY; OXIDE MINERALS; REFRACTORY METAL COMPOUNDS; TIN OXIDES; TRANSPARENT CONDUCTING OXIDES; WIDE BAND GAP SEMICONDUCTORS; ZIRCONIUM COMPOUNDS;

CHARACTERIZATION; PLASMONIC METAMATERIALS;

EID: 84860126523     PISSN: None     EISSN: 21593930     Source Type: Journal    
DOI: 10.1364/OME.1.001090     Document Type: Article

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