Real-time spectroscopic ellipsometry study of ultrathin diffusion barriers for integrated circuits

Journal of Applied Physics

Volumn 96, Issue 7, 2004, Pages 3949-3955

  Aouadi, S M ^a   Shreeman, P K ^a   Williams, M ^b  

^a SOUTHERN ILLINOIS UNIVERSITY   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRANSPORT; FILM ARCHITECTURE; REAL-TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE); ULTRATHIN DIFFUSION BARRIERS;

ANNEALING; COATINGS; COMPOSITION; CURRENT DENSITY; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY; ELECTRON SPECTROSCOPY; ELECTRON TRANSPORT PROPERTIES; ELECTRONS; ELLIPSOMETRY; FUSED SILICA; MAGNETRON SPUTTERING; SILICON; TANTALUM COMPOUNDS; ULTRATHIN FILMS; X RAY DIFFRACTION ANALYSIS;

INTEGRATED CIRCUITS;

EID: 7044251998     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1784621     Document Type: Article

References (20)

1. A. E. Kaloyeros and E. Eisenbraun, Annu. Rev. Mater. Sci. 30, 363 (2000).
2. A. A. Istratov and E. R. Weber, J. Electrochem. Soc. 149, 021 (2002).
3. Y. Wang, C. Zhu, Z. Song, and Y. Li, Microelectron. Eng. 71, 69 (2004).
4. M. B. Takeyama, A. Noya, and K. Sakanishi, J. Vac. Sci. Technol. B 18, 1333 (2000).
5. H. C. Kim and T. L. Alford, Thin Solid Films 449, 6 (2004).
6. W.-F. Wu, K.-L. Ou, C.-P. Chou, and C.-C. Wu, J. Electrochem. Soc. 150, 083 (2003).
7. A. Z. Moshfegh and O. Akhavan, Thin Solid Films 370, 10 (2000).
8. S. M. Aouadi, M. Debessai, and P. Filip, J. Vac. Sci. Technol. B 22, 1134 (2004).
9. P. Patsalas and S. Logothetidis, J. Appl. Phys. 93, 989 (2003).
10. L. R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 9, 344 (1985).
11. J. A. Woollam Co., Inc., Guide to using WVASE 32 (Lincoln Square Publishing Company, NE, 1997).
12. F. Wootten, Optical Properties of Solids (Academic, New York, 1972).
13. P. Patsalas and S. Logothetidis, Surf. Coat. Technol. 180, 421 (2004).
14. S. M. Rossnagel and T. S. Kuan, J. Vac. Sci. Technol. B 22, 240 (2004).
15. M. Brügemann, A. Masten, and P. Wibmann, Thin Solid Films 406, 294 (2002).
16. E. V. Narnat, D. Nagakura, P.-I. Wang, and T. M. Lu, J. Appl. Phys. 91, 1667 (2002).
17. W. Steinhgl, G. Schindler, G. Setinlesberger, and M. Engelhardt, Phys. Rev. B 66, 075414 (2002).
18. M. Li, Y.-P. Zhao, and G.-C. Wang, J. Vac. Sci. Technol. A 18, 2992 (2000).
19. K. Holloway, P. M. Fryer, C. Cabral, Jr., J. M. E. Harper, P. J. Bailey, and K. H. Kelleher, J. Appl. Phys. 71, 5433 (1992).
20. J. Birch, F. Eriksson, G. A. Johansson, and H. M. Hertz, Vacuum 68, 275 (2002).