Optical characterization of TiN/SiO 2 (1000 nm)/Si system by spectroscopic ellipsometry and reflectometry

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 270-275

  Postava, K ^a   Aoyama, M ^a   Yamaguchi, T ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Optical functions; Reflectivity; Spectroscopic ellipsometry; TiN

Indexed keywords

DIFFUSION; ELLIPSOMETRY; REFLECTOMETERS; SEMICONDUCTING SILICON; SILICA; SPECTROSCOPIC ANALYSIS; TITANIUM NITRIDE;

DIFFUSION BARRIER LAYERS;

SEMICONDUCTING FILMS;

EID: 0035873356     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00095-2     Document Type: Article

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