Relative orientation of the constituents on the degree of crystallographic coherence in AlN/TiN superlattices

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 4062-4067

  Karimi, A ^a   Allidi, G ^a   Sanjines, R ^a  

^a EPFL   (Switzerland)

Author keywords

AlN TiN multilayer; Crystallographic coherence; Fibre texture; Hardness enhancement; HRTEM; Magnetron sputtering; Superlattice films

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; EPITAXIAL GROWTH; HARDNESS; MAGNETRON SPUTTERING; MULTILAYERS; NANOSTRUCTURED MATERIALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CRYSTALLOGRAPHIC COHERENCE; DUAL-CATHODE MAGNETRON SPUTTERING; MULTILAYER THIN FILMS; NANOCRYSTALLINE LAYERS;

METALLIC SUPERLATTICES;

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; EPITAXIAL GROWTH; HARDNESS; MAGNETRON SPUTTERING; METALLIC SUPERLATTICES; MULTILAYERS; NANOSTRUCTURED MATERIALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 33751222569     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.041     Document Type: Article

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